Abstract: A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface of the light shielding film has a first contact angle of 40° to 45° measured by using diiodo-methane as a first liquid contacting the surface of the light shielding film, is disclosed.

Abstract: A method of cleaning a substrate for a blank mask including: a first cleaning including irradiating a cleaning target substrate with a pre-treatment light to prepare a substrate cleaned with light, and a second cleaning including applying a first cleaning solution and a post-treatment light to the substrate cleaned with light to prepare the substrate for the blank mask, is disclosed.

Abstract: Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to ?0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.

Abstract: A blank mask including: a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one of oxygen and nitrogen, and wherein the light shielding film has an SA1 value of 60 to 90 mN/m according to Equation 1-1: SA1=?SL×tan ???[Equation 1-1] where, in the Equation 1-1, the ?SL is an interfacial energy between the light shielding film and a pure water and ? is a contact angle of the light shielding film measured with the pure water, is disclosed.

Abstract: The present disclosure relates to a blank mask and the like, and comprises a transparent substrate and a light shielding film disposed on the transparent substrate. The light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The light shielding film comprises a first light shielding layer and a second light shielding layer disposed on the first light shielding layer. The light shielding film has an Rd value of Equation 1 below which is 0.4 to 0.8. Rd=er2/er1??[Equation 1] In the Equation 1, the er1 value is an etching rate of the first light shielding layer measured by etching with argon gas. The er2 value is an etching rate of the second light shielding layer measured by etching with argon gas. In such a blank mask, a resolution degradation can be suppressed effectively when the light shielding film is patterned.

Abstract: The present disclosure relates to a blank mask including: a transparent substrate; and a light shielding film disposed on the transparent substrate, wherein the light shielding film comprises a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a Mtr value of Equation 1 below of a surface of the light shielding film is 6 or less: Mtr=|Rsk|*Rku ??[Equation 1] where, in the Equation 1, |Rsk| is an absolute value of an Rsk value, which is a height skewness of the surface of the light shielding film, and Rku is kurtosis of the surface of the light shielding film.

Abstract: Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below: 0 nm<Wr?Wo?3 nm??[Equation 1] where, in the Equation 1 above, Wo is a surface roughness of the measuring zone before soaking and washing processes, Wr is a surface roughness of the measuring zone after soaking in SC-1 (standard clean-1) solution and washing with ozone water, and the SC-1 solution comprises NH4OH, H2O2, and H2O.

Abstract: A photomask blank includes a light-transmitting substrate, and a shading layer part disposed on the light-transmitting substrate, the shading layer part including a first shading layer having a first hardness and a second shading layer having a second hardness. The first shading layer is disposed closer to the light-transmitting substrate than the second shading layer, and a value of the first hardness is larger that a value of the second hardness.

Abstract: A blank mask including a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The phase shift film has XRD maximum peak at 2? of 15° to 30° when normal mode XRD analysis is performed on an upper surface of the phase shift film. The transparent substrate has XRD maximum peak at 2? of 15° to 30° when performing normal mode XRD analysis on a lower surface of the transparent substrate. AI1 value of the blank mask expressed by below Equation is 0.9 to 1.1. AI ? ? 1 = XM ? ? 1 XQ ? ? 1 XM1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on upper surface of the phase shift film. XQ1 is the maximum value of the measured X-ray intensity when the normal mode XRD analysis is performed on the lower surface of the transparent substrate.

Abstract: The present disclosure relates to a blank mask and the like, and comprises a transparent substrate, a phase shift film disposed on the transparent substrate, and a light shielding film disposed on the phase shift film. The blank mask has a TFT1 value of 0.25 ?m/100° C. or less expressed by Equation 1 below: TFT ? ? 1 = ? ? ? PM T ? ? 2 - T ? ? 1 [ Equation ? ? 1 ] where, when the thermal variation of the processed blank mask, which is formed by processing the thickness of the transparent substrate of the blank mask to be 0.6 mm and removing the light shielding film, is analyzed in a thermomechanical analyzer, the measuring temperature of the thermomechanical analyzer is increased from T1 to T2, and ?PM is a position change of the upper surface of the phase shift film in the thickness direction at T2, based on a position of the upper surface of the phase shift film at T1.

Abstract: A method for processing fingerprint information may include obtaining an input image corresponding to at least a region of a user fingerprint, searching a memory storing at least one registered image for a reference registered image that matches the input image at least partially, determining a unique region of the input image in which the input image does not overlap with the reference registered image when the input image is aligned with the reference registered image, and, in response to a score of the unique region of the input image being greater than or equal to a predetermined reference score, classifying the input image as belonging to a same group as the reference registered image and storing the input image in the memory.

Abstract: Provided are a data communication method using a secure element and an electronic system adopting the same. The data communication method includes: exchanging certificate information between an application processor of an electronic device and a secure element; setting up a secure channel through mutual authentication between the application processor and the secure element by using a public key and a secret key after the exchange of the certification information; and performing data communication between the application processor and the secure element through the secure channel.

Abstract: A method for processing fingerprint information includes dividing an input image that corresponds to at least a portion of a user fingerprint into a plurality of first regions; dividing a registered image that had previously been stored into a plurality of second regions; selecting a first matching region from among the plurality of first regions, and selecting a second matching region from among the plurality of second regions, by comparing the plurality of first regions with the plurality of second regions; and matching the registered image with the input image by comparing the first matching region with the second matching region.

Abstract: In a method of controlling an electronic device using a wearable device, the electronic device is paired with the wearable device. A cryptographic key, which corresponds to the electronic device, is stored in a secure storage device included in the wearable device. A distance between the wearable device and the electronic device is estimated by the wearable device. An unlock signal including the cryptographic key, which is stored in the secure storage device, is transmitted from the wearable device to the electronic device when the estimated distance is smaller than a threshold distance. The electronic device is unlocked based on the unlock signal.

Abstract: A method for communicating medical data includes forming a secure channel between a first medical device and a second medical device connected to each other through a network on the basis of first authentication information of the first medical device and second authentication information of the second medical device; encrypting medical data that is obtained by the first medical device using a secure circuit that is provided in the first medical device; and transmitting the encrypted medical data to the second medical device through the secure channel.

Abstract: A method for processing fingerprint information may include obtaining an input image corresponding to at least a region of a user fingerprint, searching a memory storing at least one registered image for a reference registered image that matches the input image at least partially, determining a unique region of the input image in which the input image does not overlap with the reference registered image when the input image is aligned with the reference registered image, and, in response to a score of the unique region of the input image being greater than or equal to a predetermined reference score, classifying the input image as belonging to a same group as the reference registered image and storing the input image in the memory.

Abstract: A method for processing fingerprint information includes dividing an input image that corresponds to at least a portion of a user fingerprint into a plurality of first regions; dividing a registered image that had previously been stored into a plurality of second regions; selecting a first matching region from among the plurality of first regions, and selecting a second matching region from among the plurality of second regions, by comparing the plurality of first regions with the plurality of second regions; and matching the registered image with the input image by comparing the first matching region with the second matching region.

Abstract: A method of data transfer in an electronic device including a secure module, which includes a processor and a secure element, an application processor, and a sensor, may include: switching an operation mode of the processor to a bypass mode; performing a cross-authentication, by the application processor and the secure element; generating a session key, by the application processor and the secure element, when the cross-authentication is succeeded; switching the operation mode of the processor to a normal mode; encrypting, by the secure module, sensing data provided by the sensor using the session key; transferring the encrypted sensing data from the processor to the application processor; and/or acquiring, by the application processor, the sensing data by decrypting the encrypted sensing data using the session key.

Abstract: A method for updating software includes verifying an update for first software that drives a security execution environment in a non-security execution environment, updating the first software by use of a first image of the first software update stored in the non-security execution environment, verifying an update for second software that drives a security device controlled by the security execution environment, in the security execution environment, and updating the second software by use of a second image of the second software update stored in the security execution environment.

Abstract: Provided are a data communication method using a secure element and an electronic system adopting the same. The data communication method includes: exchanging certificate information between an application processor of an electronic device and a secure element; setting up a secure channel through mutual authentication between the application processor and the secure element by using a public key and a secret key after the exchange of the certification information; and performing data communication between the application processor and the secure element through the secure channel.