Patents by Inventor Sung-Il Park
Sung-Il Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12214790Abstract: Disclosed may be a method for evaluating valet mode driving of a vehicle. The method includes determining whether or not a valet mode entry condition may be satisfied, determining a plurality of driving evaluation factors for valet parking based on at least one of a vehicle status or a driving environment, upon determining that the valet mode entry condition may be satisfied, calculating a valet driving evaluation score by analyzing the determined driving evaluation factors and collecting result values acquired through analysis, and displaying the calculated valet driving evaluation score.Type: GrantFiled: November 29, 2022Date of Patent: February 4, 2025Assignees: Hyundai Motor Company, Kia CorporationInventors: Gyu Ri Lee, Seong Wook Moon, Do Hwa Kim, Sung Bae Jeon, Sung Il Jung, Jae Young Park, Jeong Eun Kim, Hui Un Son
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Patent number: 12219810Abstract: The display device includes a substrate including a plurality of pixel areas; and a pixel in each of the plurality of pixel areas. The pixel may include a pixel circuit layer on the substrate and including at least one transistor; a first electrode on the pixel circuit layer and electrically connected to the transistor; a plurality of light emitting elements on the first electrode and electrically connected to the first electrode; a second electrode on the plurality of light emitting elements; and a light blocking pattern on the second electrode and including a plurality of openings corresponding to each of the plurality of light emitting elements. Here, each of the plurality of pixel areas may include an emission area corresponding to each of the plurality of openings and a non-emission area excluding the emission area.Type: GrantFiled: November 8, 2021Date of Patent: February 4, 2025Assignee: Samsung Display Co., Ltd.Inventors: Jin Woo Choi, Min Woo Kim, Sung Kook Park, Dae Ho Song, Byung Choon Yang, Hyung Il Jeon
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Patent number: 12218193Abstract: An integrated circuit (IC) device includes a first region and a second region adjacent to each other along a first direction on a substrate, fin patterns in each of the first and second regions extending along a second direction perpendicular to the first direction; gate electrodes extending along the first direction and intersecting the fin patterns; and an isolation region between the first and second regions, a bottom of the isolation region having a non-uniform height relative to a bottom of the substrate.Type: GrantFiled: November 17, 2021Date of Patent: February 4, 2025Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jae-hyun Park, Kye-hyun Baek, Yong-ho Jeon, Cheol Kim, Sung-il Park, Yun-il Lee, Hyung-suk Lee
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Patent number: 12218410Abstract: Disclosed is a portable communication device including a housing; a first PCB; a wireless communication circuitry disposed on the first PCB; and a second PCB having a plurality of layers including a first PCB portion; a second PCB portion extended from the first PCB portion and more flexible than the first PCB portion; a third PCB portion extended from the second PCB portion and less flexible than the second PCB portion; a fourth PCB portion extended from the third PCB portion and more flexible than the third PCB portion; and a plurality of lines formed at a same layer of the plurality of layers as extended from the second PCB portion through the third PCB portion to the fourth PCB portion, the plurality of lines including a first ground line and a second ground line, and a first signal line between the first and second ground lines.Type: GrantFiled: September 1, 2023Date of Patent: February 4, 2025Assignee: Samsung Electronics Co., Ltd.Inventors: Han-Min Cho, Chan-Gi Park, Yeon-Sang Yun, Tae-Wook Ham, Hei-Seong Kwak, Byoung-Il Son, Sung-Chul Park
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Publication number: 20250040117Abstract: A method for fabricating a semiconductor device includes forming a stack body including a recess target layer over a lower structure; forming sacrificial isolation openings in the stack body; forming sacrificial isolation layers including blocking layers in the sacrificial isolation openings; forming sacrificial vertical openings in the stack body between the sacrificial isolation layers; forming a preliminary horizontal layer by recessing the recess target layer of the stack body through the sacrificial vertical openings; forming a first dielectric layer that covers the preliminary horizontal layer; forming a second dielectric layer over the first dielectric layer; forming cell isolation openings by removing the sacrificial isolation layers; and trimming the first dielectric layer through the cell isolation openings.Type: ApplicationFiled: February 1, 2024Publication date: January 30, 2025Inventors: Sung Mean PARK, Seung Hwan KIM, Dong Il SONG
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Publication number: 20250040241Abstract: A semiconductor device includes a first active pattern extending in a first direction, a second active pattern on the first active pattern and extending in the first direction, a gate structure on the first active pattern and the second active pattern and extending in a second direction intersecting the first direction, a first source/drain region on side faces of the gate structure and connected to the first active pattern, a second source/drain region on the side faces of the gate structure and connected to the second active pattern, and an intermediate connecting layer which includes a first intermediate conductive pattern between the first active pattern and the second active pattern, and a second intermediate conductive pattern connected to the first intermediate conductive pattern between the first source/drain region and the second source/drain region.Type: ApplicationFiled: February 1, 2024Publication date: January 30, 2025Applicant: Samsung Electronics Co., Ltd.Inventors: Sung Il PARK, Jae Hyun PARK, Jin Wook YANG
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Patent number: 12193887Abstract: An apparatus for surgical lighting is disclosed. The apparatus includes a light emitting element formed with a light source encapsulated within an outer layer. The outer layer includes a biocompatible material. A power supply is coupled to the light source. The apparatus includes an actuating mechanism that controls power from the power supply to the light source to emit light along a surgical area. The light emitting element provides enhanced illumination and other surgical advantages.Type: GrantFiled: April 13, 2023Date of Patent: January 14, 2025Assignees: Dignity Health, The Texas A&M University SystemInventors: Clinton Morgan, Peter Nakaji, Sung Il Park
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Patent number: 12104956Abstract: In one aspect, a hyperspectral image measurement device is provided to include: a main body; an illumination module disposed in the main body and including LEDs having different peak wavelengths to irradiate light to a subject; a camera disposed on the main body and receiving light reflected from the subject to acquire an image of the subject; a barrel having a contact surface contacting the subject, the contact surface located to be spaced apart from the illumination module and the camera module by a predetermined distance; and a reference cover located on the contact surface and including a standard reflection layer for reflecting light irradiated from the illumination module toward the camera module.Type: GrantFiled: March 9, 2022Date of Patent: October 1, 2024Assignee: SEOUL VIOSYS CO., LTD.Inventors: Seong Tae Jang, Stella Park, Sung Il Park, Ji Ye Song, Woong Ki Jeong
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Publication number: 20240258430Abstract: Disclosed is a semiconductor device including a first channel layer on a substrate, and a second channel layer on the first channel layer, the first and second channel layers extending in a first direction while being spaced apart from the substrate, and including a 2D semiconductor material, a gate structure on the substrate, the gate structure extending in a second direction, and being penetrated by the first and second channel layers, and source/drain contacts on side surfaces of the gate structure and being connected to the first and second channel layers. The gate structure includes a first gate portion between the substrate and the first channel layer and having a first gate length, a second gate portion between the first and second channel layers and having a second gate length, and a third gate portion on an upper surface of the second channel layer and having a third gate length.Type: ApplicationFiled: October 24, 2023Publication date: August 1, 2024Applicant: Samsung Electronics Co., Ltd.Inventors: Sung Il PARK, Min Jun LEE, Jae Hyun PARK
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Publication number: 20240093682Abstract: Provided is a diaphragm pump. The diaphragm pump operates such that a viscous liquid is discharged by transferring a pressing force via a diaphragm that is elastically deformed. The diaphragm pump has a structure capable of rapidly and accurately discharging the viscous liquid of high viscosity by using a diaphragm. Also, the diaphragm pump is capable of effectively pressing the viscous liquid while preventing the damage to the particles contained in the viscous liquid, by preventing the mechanical structure pressing the viscous liquid from coming into direct contact with the viscous liquid.Type: ApplicationFiled: September 19, 2023Publication date: March 21, 2024Applicant: PROTEC CO., LTD.Inventors: Keon Hee KIM, Sung Il PARK
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Publication number: 20240096879Abstract: A semiconductor device is provided. The semiconductor device includes an active pattern extending in a first horizontal direction, a plurality of lower nanosheets stacked on the active pattern and spaced apart from one another in a vertical direction, a separation layer on the plurality of lower nanosheets, a plurality of upper nanosheets stacked on the separation layer and spaced apart from one another in the vertical direction, a gate electrode extending on the active pattern in a second horizontal direction, the gate electrode surrounding each of the plurality of lower nanosheets, the separation layer and the plurality of upper nano sheets, and a first conductive layer between the gate electrode and each of a top surface and a bottom surface of the plurality of upper nanosheets. The first conductive layer is not between the gate electrode and sidewalls of the plurality of upper nanosheets.Type: ApplicationFiled: April 11, 2023Publication date: March 21, 2024Applicant: Samsung Electronics Co., Ltd.Inventors: Kyu Man HWANG, Sung Il PARK, Jin Chan YUN, Dong Kyu LEE
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Publication number: 20240055432Abstract: A semiconductor device includes a fin type pattern extending in a first direction on a substrate, a first gate electrode extending in a second direction intersecting the first direction on the fin type pattern, a source/drain region on a side wall of the first gate electrode and in the fin type pattern, a separation structure extending in the first direction on the substrate, the separation structure including a first trench and being spaced apart from the fin type pattern and separating the first gate electrode, an interlayer insulating layer on a side wall of the separation structure and covering the source/drain region, the interlayer insulating layer including a second trench having a lower surface lower than a lower surface of the first trench, and a contact connected to the source/drain region and filling the first trench and the second trench.Type: ApplicationFiled: September 28, 2023Publication date: February 15, 2024Inventors: Joong Gun Oh, Sung Il Park, Jae Hyun Park, Hyung Suk Lee, Eun Sil Park, Yun Il Lee
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Patent number: 11864547Abstract: An adhesive-type insect trap includes a body having a hole for insertion of an adhesive sheet; a light source mounting unit disposed on the body; and a cover which is detachably mounted on the body and has a through-hole in at least a part thereof, and an adhesive sheet including a sticky substance and a sheet. The body includes a guide unit by which the adhesive sheet is guided, and the cover comprises a light refraction unit therein or on a surface thereof.Type: GrantFiled: January 8, 2018Date of Patent: January 9, 2024Assignee: SEOUL VIOSYS CO., LTD.Inventors: Sang Hyun Chang, Hoon Sik Eom, Si Ho Yu, Gwang Ryong Lee, Chung Hoon Lee, Sung Il Park
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Patent number: 11804490Abstract: A semiconductor device includes a fin type pattern extending in a first direction on a substrate, a first gate electrode extending in a second direction intersecting the first direction on the fin type pattern, a source/drain region on a side wall of the first gate electrode and in the fin type pattern, a separation structure extending in the first direction on the substrate, the separation structure including a first trench and being spaced apart from the fin type pattern and separating the first gate electrode, an interlayer insulating layer on a side wall of the separation structure and covering the source/drain region, the interlayer insulating layer including a second trench having a lower surface lower than a lower surface of the first trench, and a contact connected to the source/drain region and filling the first trench and the second trench.Type: GrantFiled: November 23, 2021Date of Patent: October 31, 2023Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Joong Gun Oh, Sung Il Park, Jae Hyun Park, Hyung Suk Lee, Eun Sil Park, Yun Il Lee
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Patent number: 11751554Abstract: An adhesive-type insect trap includes a main body having an adhesive sheet insertion hole; a light source mounting unit disposed on the main body; a cover which is detachably mounted on the main body and has a through-hole in at least a part thereof; an adhesive sheet including a sticky substance and a sheet. The main body includes a guide unit by which the adhesive sheet is guided, and an adhesive sheet support unit for supporting the adhesive sheet.Type: GrantFiled: January 5, 2018Date of Patent: September 12, 2023Assignee: SEOUL VIOSYS CO., LTD.Inventors: Sang Hyun Chang, Hoon Sik Eom, Si Ho Yu, Gwang Ryong Lee, Chung Hoon Lee, Sung Il Park
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Publication number: 20230261078Abstract: A semiconductor device having high performance and a high degree of integration includes a substrate, a first transistor disposed on the substrate, the first transistor comprising a first active pattern including a first two-dimensional semiconductor material, a first gate electrode through which the first active pattern penetrates, and a first source/drain contact connected to the first active pattern on a side surface of the first gate electrode, a second transistor disposed on an upper surface of the first transistor, the second transistor comprising a second active pattern including a second two-dimensional semiconductor material, a second gate electrode through which the second active pattern penetrates, and a second source/drain contact connected to the second active pattern on a side surface of the second gate electrode, and a first wiring structure interposed between the first transistor and the second transistor, and electrically connecting the first transistor and the second transistor.Type: ApplicationFiled: September 26, 2022Publication date: August 17, 2023Inventors: SUNG IL PARK, Jae Hyun PARK
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Publication number: 20230256995Abstract: A metaverse autonomous driving system includes a vehicle server that receives camera image signals and a GPS signal, displays a metaverse autonomous driving image, and controls a vehicle in an autonomous driving state, a camera image input device that receives and provides image signals from cameras on the vehicle to the vehicle server in real time, a GPS input device that provides current GPS position information of the vehicle to the vehicle server in real time, a display that provides an I/O interface so that a driver can give an instruction for autonomous driving through a metaverse image, an ECU that operates a vehicle controller on the basis of an autonomous driving control instruction transmitted from the vehicle server, the vehicle controller that controls the vehicle on the basis of the control instruction, and a communication device that wirelessly communicates with other vehicles equipped with the metaverse autonomous driving system.Type: ApplicationFiled: March 2, 2022Publication date: August 17, 2023Inventors: Chan Duk PARK, Byeong Ryeol CHOI, Dong Ok IM, Woong Do PARK, Sung Il PARK
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Publication number: 20230261064Abstract: There is provided a semiconductor device having reduced contact resistance and enhanced performance. The semiconductor device includes a substrate, a first active pattern spaced apart from the substrate and extending in a first direction, and including a first two-dimensional semiconductor material, a first gate electrode extending in a second direction intersecting the first direction on the substrate, and through which the first active pattern penetrates, and a first source/drain contact which includes a first contact insertion film and a first filling metal film sequentially stacked on a side surface of the first gate electrode, and is connected to the first active pattern, wherein the first contact insertion film at least partially surrounds a lower surface, a side surface and an upper surface of an end portion of the first active pattern, and the first active pattern and the first contact insertion film form an ohmic contact.Type: ApplicationFiled: September 20, 2022Publication date: August 17, 2023Inventors: SUNG IL PARK, JAE HYUN PARK
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Publication number: 20230201848Abstract: A spray pump formed to atomize and apply a viscous liquid may micro-discharge the viscous liquid ranging from low to high viscosity in a quantitative manner, may miniaturize a device capable of atomizing liquids by spraying, and may shorten a spraying path to prevent changes in liquid properties and keep spraying quality constant.Type: ApplicationFiled: September 22, 2022Publication date: June 29, 2023Applicant: PROTEC CO., LTD.Inventors: Seung Min HONG, EUI KEUN CHOI, Sung Il PARK, Keon Hee KIM
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Patent number: 11654094Abstract: The present specification relates to a composition for external application to skin with improved solubility and feeling during use, comprising a benzoic acid amide compound, an isomer thereof, a pharmaceutically acceptable salt thereof, a hydrate thereof or a solute that is a solvate thereof, and a first cyclodextrin solubilizing agent.Type: GrantFiled: March 26, 2018Date of Patent: May 23, 2023Assignee: AMOREPACIFIC CORPORATIONInventors: Chang-geun Yi, Suil Kim, Sung Il Park, Hong-ju Shin