Abstract: A magnetic powder contains magnetic particles, a first coating layer disposed on surfaces of the magnetic particles and containing a first glass, and a second coating layer disposed on the first coating layer and containing a second glass different from the first glass. A method of manufacturing magnetic powder includes preparing magnetic particles, forming a first coating layer containing a first glass on surfaces of the magnetic particles, and forming a second coating layer containing a second glass different from the first glass on the first coating layer.

Abstract: The present specification relates to a spiro compound and an organic electronic device including the same.

Abstract: Disclosed is a makeup brush cleaning kit. According to the present invention, the makeup brush cleaning kit includes: a base body; a cover body coupled openably/closably to the base body; and a cleaning unit disposed in the cover body and serving as a cleaning place for the makeup brush, wherein the cleaning unit has a plurality of drainage holes formed thereon in such a manner as to communicate with the outside of the cover body.

Abstract: A magnetic powder contains magnetic particles, a first coating layer disposed on surfaces of the magnetic particles and containing a first glass, and a second coating layer disposed on the first coating layer and containing a second glass different from the first glass. A method of manufacturing magnetic powder includes preparing magnetic particles, forming a first coating layer containing a first glass on surfaces of the magnetic particles, and forming a second coating layer containing a second glass different from the first glass on the first coating layer.

Abstract: Disclosed herein is a temperature sensor assembly. The temperature sensor assembly comprises an element that is a sensing resistor, a pair of parallel lead wires connected to the element, a laminate configured to mechanically protect and surround the element and the lead wires, and lead wire drawn out parts extended and protruded from the lead wires to the outside of the laminate.

Abstract: A scan data control apparatus includes a trigger circuit, a scan sequencer, a shift register, and a transmitter. The trigger circuit is configured to receive a trigger signal, detect a malfunction of a system and output a scan mode start signal and a scan mode end signal. The scan sequencer is configured to output scan enable signals corresponding to a CPU and a master to the CPU and the master. The shift register is configured to receive scan data of the CPU and the master from the CPU and the master. The transmitter is configured to receive the scan data of the CPU and the master and output the scan data to a memory.

Abstract: The present specification relates to a hetero-cyclic compound and an organic light emitting device including the same.

Abstract: A computing system includes a processor that operates a plurality of virtual machines in which a plurality of operating systems are respectively executed. The processor executes a hypervisor that groups the plurality of virtual machines into a normal virtual machine group and a privilege virtual machine group, and that controls hardware accesses requested by the normal virtual machine group and the privilege virtual machine group. The processor executes a normal application in the normal virtual machine group, and executes a secure application in the privilege virtual machine group.

Abstract: Disclosed are a composition for coating a photoresist pattern and a method for forming a fine pattern using the same. The composition for coating a photoresist pattern includes a polymer compound containing a hydroxyl group and an ammonium base, and a solvent. The method for forming a fine pattern includes coating the composition on a previously formed photoresist pattern to thereby effectively reduce the size of a photoresist contact hole or space, and can be used in all semiconductor processes in which a fine pattern is required to be formed.

Abstract: A gap-fill polymer for filling fine pattern gaps, which has a low dielectric constant (low-k) and excellent gap filling properties, may consist of a compound formed by condensation polymerization of a first oligomer represented by the formula 1 and a second oligomer represented by the formula 2.

Abstract: A gap-fill polymer for filling fine pattern gaps, which has a low dielectric constant (flow-k) and excellent gap filling properties may consist of a compound formed by condensation polymerization of a first oligomer represented by the formula 1 and a second oligomer represented by the formula 2.

Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A? , X, Y, I, m and n are the same as described in the detailed description.

Abstract: An application producing method regarding a first and second application, the method includes receiving an application generation request related to a second application, the second application being subordinate to a first application, generating the second application and computer readable instructions related to a switch interface for selecting at least one of the first and second applications, the switch interface computer readable instructions related to the switch interface, which when executed by at least one application executing apparatus, causes the application executing apparatus to display the switch interface on at least one of the first and second applications, and when the switch interface is in a first state, the first application is controlled based on a first user input received by the at least one application executing apparatus, and when the switch interface is in a second state, the second application is controlled based on the first user input.

Abstract: A central processing unit (CPU) system includes a CPU configured to execute a program based on multiple pieces of register information, a CPU hang-up detector configured to detect a hang-up state of the CPU and generate a CPU hang-up occurrence signal, and a memory that stores debug logic configured to gather the multiple pieces of register information from the CPU in response to the CPU hang-up occurrence signal before a reset operation for the CPU is performed.

Abstract: Disclosed are a composition for coating a photoresist pattern and a method for forming a fine pattern using the same. The composition for coating a photoresist pattern includes a polymer compound containing a hydroxyl group and an ammonium base, and a solvent The method for forming a fine pattern includes coating the composition on a previously formed photoresist pattern to thereby effectively reduce the size of a photoresist contact hole or space, and can be used in all semiconductor processes in which a fine pattern is required to be formed.

Abstract: A probe for an ultrasound system, and a method of manufacturing the same are disclosed. The probe includes a backing layer, an electrode part formed on the backing layer, and a piezoelectric member installed to the electrode part. The probe is manufactured by connecting the piezoelectric member to the PCB via a unidirectional conduction part, instead of soldering which requires difficult and laborious operations, thereby allowing easy connection therebetween while reducing an operation time for connection.

Abstract: An electronic white board that includes a display configured to display a screen, a first sensor configured to sense a touch on the display, a second sensor configured to sense electromagnetic waves emitted from an object that touches the display, and a controller configured to perform a function that corresponds to the touch that is sensed by any one of the first sensor and the second sensor depending on whether the electromagnetic waves are sensed by the second sensor.

Abstract: Disclosed are a composition for coating a photoresist pattern and a method for forming a fine pattern using the same. The composition for coating a photoresist pattern includes an ammonium base-containing polymer compound and a solvent. The method for forming a fine pattern includes coating the composition on a previously formed photoresist pattern to thereby effectively reduce the size of a photoresist contact hole or space, and can be used in all semiconductor processes in which a fine pattern is required to be formed.

Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.