Patents by Inventor Sung-Kil Park

Sung-Kil Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6673231
    Abstract: Disclosed is a method for removing sludge in a crude oil storage tank by use of thermal oil discharged from a distillation tower of an oil refinery, such as atmospheric residue, vacuum residue, or vacuum gas oil, and recovering oil having various applications by separating inorganics therefrom. The method is advantageous in terms of minimizing air pollution because of utilizing a closed system, drastically reduced washing time of crude oil storage tank, and continuous removal of the sludge. Additionally, the recovered oil can be provided as fuel oil, marine oil or a feed for secondary treatment processes, such as up-grading processes of heavy oil.
    Type: Grant
    Filed: September 24, 2001
    Date of Patent: January 6, 2004
    Assignee: SK Corporation
    Inventors: Myung-Jun Kim, Dae-Seog Yoon, Chang-Hyo Choi, June-Tae Choi, Jong-Won Kwak, Sung-Kil Park
  • Publication number: 20020153279
    Abstract: Disclosed is a method for removing sludge in a crude oil storage tank by use of thermal oil discharged from a distillation tower of an oil refinery, such as atmospheric residue, vacuum residue, or vacuum gas oil, and recovering oil having various applications by separating inorganics therefrom. The method is advantageous in terms of minimizing air pollution because of utilizing a closed system, drastically reduced washing time of crude oil storage tank, and continuous removal of the sludge. Additionally, the recovered oil can be provided as fuel oil, marine oil or a feed for secondary treatment processes, such as up-grading processes of heavy oil.
    Type: Application
    Filed: September 24, 2001
    Publication date: October 24, 2002
    Inventors: Myung-Jun Kim, Dae-Seog Yoon, Chang-Hyo Choi, June-Tae Choi, Jong-Won Kwak, Sung-Kil Park
  • Patent number: 5451291
    Abstract: In the formation of a via contact hole of a semiconductor device, a polymer layer on the sidewall of a photoresist layer and via contact hole is effectively removed and the short of the via contact hole does not occur. For achieving such purpose, a wafer is cleaned in deionized water being added with CO.sub.2 gas during the process used for forming the via contact hole, and a protecting film (Al.sub.2 O.sub.3) is formed on a metal layer. Thereafter, since the polymer layer and a part of the photoresist layer is removed, the metal layer is not eroded and the polymer layer is completely removed.
    Type: Grant
    Filed: March 26, 1993
    Date of Patent: September 19, 1995
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Sung-Kil Park, Dong-Sauk Kim, Yong-Hyeock Yoon
  • Patent number: D373352
    Type: Grant
    Filed: January 30, 1995
    Date of Patent: September 3, 1996
    Assignee: Daewoo Electronics Co., Ltd.
    Inventor: Sung-Kil Park