Abstract: A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.

Abstract: Provided is a technology involving differentiating preadipocytes, derived from human adipose tissues, into adipocytes and transplanting the differentiated adipocytes in conjunction with a biodegradable scaffold into the body. According to the present invention, when immature adipocytes having a cell diameter of 20 to 40 ?m, obtained by differentiation of adipose tissue-derived preadipocytes into adipose tissues, are used in conjunction with a scaffold in autologous or allogeneic transplantation, maturation of adipocytes at the target transplantation site leads to a gradual increase in the volume of adipocytes. Therefore, the adipocyte-scaffold composition according to the present invention can be utilized as an effective body volume replacement and can treat various disorders due to defects of soft tissues or aesthetic defects in appearance.

Abstract: Disclosed herein are a liquid composition for immersion lithography and a lithography method using the composition. The liquid composition includes at least one nonionic surfactant selected from the group comprising of a polyvinyl alcohol, a pentaerythritol-based compound, a polymer containing an alkylene oxide, and a compound represented by Formula I: wherein R is a linear or branched, substituted C1-C40 alkyl, and n is an integer ranging from 10 to 10,000. The surface tension of the liquid composition is reduced by the nonionic surfactant, thereby solving the problem that the liquid composition is not completely filled or is partially concentrated on a wafer having a fine topology and removing micro bubbles between the photoresist film and the liquid composition.

Abstract: A photoresist composition includes a base resin, a copolymer of acrylic acid or methacrylic acid and 3,3-dimethoxypropene, a photoacid generator, an organic base, and an organic solvent, and is used for forming a fine (micro) pattern in a semiconductor device by double patterning. The invention method can markedly reduce the number of steps in etching and hard mask deposition processes, so that work hours and manufacturing costs may be reduced, contributing to an increase in yield of semiconductor devices.

Abstract: A method for manufacturing a semiconductor device using an immersion lithography process is disclosed. The semiconductor device is manufactured by filtering an air by using an amine removing chemical filter; and applying the filtered air onto a photoresist film formed on a semiconductor substrate (i) after washing the photoresist film with water and before an exposure process or (ii) after washing the photoresist film with water and before a post-baking process. These steps thereby effectively prevent water mark defects.

Abstract: The present invention relates to an ice transfer device for a refrigerator, which can transfer ice made in an ice maker to a dispenser in the refrigerator, and a control circuit of the ice transfer device. The ice transfer device for a refrigerator according to the present invention comprises a storage container installed within the refrigerator to contain ice therein; a motor installed close to the storage container and having a motor shaft protruding in a direction opposite to a direction of transfer of the ice; a gearbox that is installed at a side opposite to a part for delivering the ice contained in the storage container to the outside, is connected to the motor shaft, and has a driving shaft protruding in the transfer direction of the ice to transmit a driving force while reducing a driving speed of the motor; and a transfer member installed within the storage container and connected to the driving shaft to push the ice forward by means of the driving of the motor.

Abstract: An ice transfer device for a refrigerator is provided. An ice-making part is provided at an upper portion of an ice maker of the refrigerator, and a storage container is provided below the ice-making part. Both edges of a bottom surface of the storage container are rounded, and a transfer member for transferring ice is provided within the storage container. Further, a motor is installed in the vicinity of one of the rounded edges of the storage container and has a motor shaft protruding toward the rear of the ice maker. A gearbox provided at the rear of the storage container has a driving shaft protruding toward the front of the ice maker. With this construction, the inner space of the refrigerator can be efficiently used.

Abstract: Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation. wherein R, x, y, z, a and b are as defined in the specification.

Abstract: Disclosed herein is a method for manufacturing a semiconductor device that includes performing an O2 plasma treatment step after forming a Si-containing photoresist film.

Abstract: Disclosed herein is a method for manufacturing a semiconductor device that includes performing an O2 plasma treatment step after forming a Si-containing anti-reflection film.

Abstract: A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light used as light sources during lithography process using light sources such as KrF, ArF, VUV, EUV, E-beam and ion beam, even when photoresist resins having high absorbance to light source are used.

Abstract: A method for forming a pattern of a semiconductor device is disclosed which can increase the contact area between a photoresist and an anti-reflective film by performing an etching process on the anti-reflective film in a process of forming a photoresist pattern for a semiconductor device so as to form fine irregularities, thereby preventing collapse of a photoresist pattern. The disclosed method includes: (a) forming an organic anti-reflective film by coating an organic anti-reflective coating composition onto an upper portion of a layer to be etched, and performing a baking process thereto; (b) forming fine irregularities on the organic anti-reflective film by performing an etching process on the formed organic anti-reflective film; and (c) forming a photoresist pattern by coating a photoresist on the upper portion of the organic anti-reflective film, exposing the photoresist and then developing the same.

Abstract: A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order to prevent formation of sloping patterns due to photoresist resins absorbing wavelength of light used as light sources during lithography process using light sources such as KrF, ArF, VUV, EUV, E-beam and ion beam, even when photoresist resins having high absorbance to light source are used.

Abstract: Disclosed herein is a functional shoe, capable of applying micro current to the sole. The shoe includes a micro-current generating part, an acupressure part, and a conduction part. The micro-current generating part is inserted in a side of the shoe, thus generating predetermined micro current and voltage. The acupressure part is made of a conductive material, and is provided on a portion where nerve points of a sole connected to organs in a body are located, thus simultaneously performing physical acupressure action and conduction of micro current. The conduction part is connected between the micro-current generating part and the acupressure part, thus transmitting the generated micro current and voltage to the acupressure part. Thereby, the functional shoe simultaneously performs physical acupressure action on specific nerve points of the sole, and transmits micro current to the nerve points using external force applied when walking.

Abstract: Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of less than 50 nm are formed. Accordingly, the disclosed negative photoresist composition is very effective for a photolithography process using EUV (Extreme Ultraviolet, 13 nm) light source. wherein R1, R2, R3, R4, R5, R6, R7, a, b and c are as defined in the description.

Abstract: A method of modulating a video data includes extracting a luminance signal and a color difference signal from the video data, modulating the luminance signal to generate a modulated luminance signal, and modulating the video data by using the modulated luminance signal and the color difference signal as an un-modulating data.

Abstract: A packet processing method using a multiple fault tolerant network structure capable of performing communication of a whole ring and disusing a useless packet when a fault occurs on a plurality of connection lines and nodes by using a dual ring structure. Nodes are connected as a ring shape separately having two input lines and two output lines, and each node selects one packet after receiving two inputs and disuses the other packet and transmits the select packet through the two output lines at the same time. The present invention can solve the fault problem occurred on a multiple link or nodes, can perform network function efficiently by disusing a useless packet, accordingly it is possible to perform stable operation for several years or several decades after the network installation and decrease maintenance expenses.

Abstract: A method for manufacturing a liquid crystal display device to simplify a manufacturing process and reduce costs. The method includes simultaneously forming a liquid crystal layer and scattering spacers on one of first and second substrates, applying sealant to a periphery of one of the first and second substrates, and bonding the first and second substrates together.