Abstract: Disclosed herein is a plasma display panel in which afterimage is improved. The plasma display panel according to the present invention includes a panel unit having an upper plate and a lower plate, a frame that supports circuitry, and a conductive material formed between the panel unit and the frame. As such, a conductive material is formed on a bottom surface of a lower plate of a panel. Thus, charges introduced into the lower plate are properly controlled to improve the waveform stability of the panel. Also, a charge characteristic is improved to implement a stable operation. Accordingly, an afterimage time can be reduced. Further, a sheet of a low hardness and light weight is used. It is thus possible to absorb shock and noise of a PDP, accomplish light weight of the PDP and reduce the materials of the sheet.

Abstract: A method of fabricating a semiconductor device wherein, in forming an overlay mark in a scribe line region between dies in a mask process, a semiconductor substrate is provided in which a contact plug is formed in a contact hole of a dielectric layer in the scribe line region and a trench is formed on the contact plug. A first metal layer for a metal line is formed in the contact plug and the dielectric layer through an ALD (Atomic Layer Deposition) method so that a step generated by the trench remains intact. A second metal layer for a metal line is formed on the first metal layer using a sputtering method so that the step remains intact.