Abstract: A pitch walk inspection method includes obtaining a scanning electron microscope (SEM) image for a line and space (L/S) pattern formed by a multi-patterning technology (MPT), where L/S pattern includes a plurality of lines and spaces that are alternately arranged; detecting a main pitch of the L/S pattern in the SEM image; dividing a graph of the main pitch into graphs of component pitches, based on the MPT; performing a Fast Fourier Transform (FFT) on each graph of the component pitches; multiplying a phase and an intensity graph of the FFT of each of the graphs of the component pitches with each other and obtaining compensated FFT phase graphs; and calculating a pitch walk for the L/S pattern by obtaining differences between phase peak values of the compensated FFT phase graphs.

Abstract: Provided is a system for processing a substrate. The system for processing the substrate includes a process tube configured to provide a processing space for the substrate and an exhaust module connected to an exhaust port of the process tube to exhaust process residues within the processing space to the outside. The exhaust module includes an exhaust tube connected to the exhaust port, a sealing case configured to accommodate at least a portion of the exhaust tube, and a local exhaust part provided in the sealing case to exhaust the inside of the sealing case.