Patents by Inventor Sung-moon PARK
Sung-moon PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240111621Abstract: Proposed is a system based on the Internet of Media Things (IoMT). The system may include at least one first sensor configured to perform a predetermined function in a target space or region, and a second sensor based on at least one of video or audio. The system may also include a first analysis processor configured to generate first analysis data of a set mission within the target space or region based on first data sensed by the first sensor. The system may further include a second analysis processor configured to generate second analysis data for a set mission within the target space or region based on second data sensed by the second sensor. The system may further include storage configured to store the sensed first data and second data and the first and second analysis data based on the identifier.Type: ApplicationFiled: September 13, 2023Publication date: April 4, 2024Inventors: JaeWon MOON, Seung Woo KUM, Seungtaek OH, Sung Joo PARK
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Publication number: 20240082345Abstract: Provided is a peptide composition for preventing or treating Alzheimer's dementia. A peptide or a salt substituent thereof according to the presently claimed subject matter exhibits effects such as suppression of LPS-mediated cytokine production, suppression of LPS-induced neuroinflammation, amelioration of cognitive impairment, suppression of beta amyloid or tau protein aggregation, and suppression of neuronal loss. The polypeptide or the salt substituent thereof can permeate the blood-brain barrier, and thus, is expected to be usefully used for preventing or treating Alzheimer's dementia.Type: ApplicationFiled: August 25, 2021Publication date: March 14, 2024Applicant: HLB SCIENCE INC.Inventors: Yeong Min PARK, Wahn Soo CHOI, Seung-Hyun LEE, In Duk JUNG, Yong Joo KIM, Seung Jun LEE, Sung Min KIM, Mi Suk LEE, Hee Jo PARK, Seung Pyo CHOI, Minho MOON, Soo Jung SHIN, Sujin KIM, Yong Ho PARK, Jae-Yong PARK, Kun Ho LEE
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Publication number: 20240079413Abstract: A complementary thin film transistor (TFT) includes a substrate and a first TFT and a second TFT disposed on the substrate, wherein a first conductive semiconductor layer of the first TFT and a second gate electrode layer of the second TFT are disposed in the same layer and include the same material.Type: ApplicationFiled: August 31, 2023Publication date: March 7, 2024Inventors: Himchan OH, Jong-Heon YANG, Ji Hun CHOI, Seung Youl KANG, Yong Hae KIM, Jeho NA, Jaehyun MOON, Chan Woo PARK, Sung Haeng CHO, Jae-Eun PI, Chi-Sun HWANG
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Patent number: 11915874Abstract: A multilayer capacitor includes a body including a dielectric layer and a plurality of internal electrodes stacked on each other with the dielectric layer interposed therebetween; and external electrodes disposed externally on the body, and respectively including a first layer connected to the internal electrode and a second layer covering the first layer, wherein the first layer includes a metal particle including an element A, an oxide of an element Z, formed on the metal particle, and an A-Z intermetallic compound phase, and here, the element Z has a higher ionization tendency than the element A.Type: GrantFiled: April 19, 2022Date of Patent: February 27, 2024Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.Inventors: Sang Moon Lee, Taek Jung Lee, Sung Ho Lee, Seol Gyeong Park
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Patent number: 11917879Abstract: A display device including: a substrate; an active layer disposed on the substrate and including active patterns; a first conductive layer disposed on the active layer; a second conductive layer disposed on the first conductive layer and including a data line; a third conductive layer disposed on the second conductive layer; and a light-emitting element disposed on the third conductive layer, wherein the first conductive layer includes a scan line, a first voltage line, and a second voltage line, the third conductive layer includes a third voltage line connected to the first voltage line and a fourth voltage line connected to the second voltage line, the first voltage line and the second voltage line extend in a first direction, the third voltage line and the fourth voltage line extend in a second direction, and the third voltage line and the fourth voltage line are alternately arranged in the first direction.Type: GrantFiled: December 13, 2021Date of Patent: February 27, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Kang Moon Jo, Dong Woo Kim, Sung Jae Moon, Jun Hyun Park, An Su Lee
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Patent number: 11837496Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.Type: GrantFiled: May 19, 2021Date of Patent: December 5, 2023Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jong Woo Sun, Sung Moon Park, Je Woo Han, Kwang Nam Kim, Ho Chang Lee, Young Hoon Jeong, Masayuki Tomoyasu
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Patent number: 11791194Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.Type: GrantFiled: May 19, 2021Date of Patent: October 17, 2023Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jong Woo Sun, Sung Moon Park, Je Woo Han, Kwang Nam Kim, Ho Chang Lee, Young Hoon Jeong, Masayuki Tomoyasu
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Publication number: 20230047219Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.Type: ApplicationFiled: October 27, 2022Publication date: February 16, 2023Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jun Soo Lee, Yoshihisa Hirano, Jae Hoon KIm, Young Jin Noh, Sung Moon Park, Seung Kyu Lim, Kyeong Seok Jeong, Hyung Kyu Choi
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Publication number: 20210272838Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.Type: ApplicationFiled: May 19, 2021Publication date: September 2, 2021Inventors: Jong Woo SUN, Sung Moon PARK, Je Woo HAN, Kwang Nam KIM, Ho Chang LEE, Young Hoon JEONG, Masayuki TOMOYASU
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Patent number: 11018046Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.Type: GrantFiled: September 4, 2019Date of Patent: May 25, 2021Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jong Woo Sun, Sung Moon Park, Je Woo Han, Kwang Nam Kim, Ho Chang Lee, Young Hoon Jeong, Masayuki Tomoyasu
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Publication number: 20200328105Abstract: A substrate processing apparatus including a process chamber; a susceptor in the process chamber; and an inner edge ring and an outer edge ring on the susceptor, wherein the inner edge ring includes a semiconductor, the outer edge ring includes an insulator, an upper surface of the outer edge ring is at a higher level than an upper surface of the inner edge ring, and the outer edge ring has an overhang extending onto the inner edge ring.Type: ApplicationFiled: September 4, 2019Publication date: October 15, 2020Inventors: Jong Woo SUN, Sung Moon PARK, Je Woo HAN, Kwang Nam KIM, Ho Chang LEE, Young Hoon JEONG, Masayuki TOMOYASU
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Publication number: 20200258753Abstract: A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.Type: ApplicationFiled: October 9, 2019Publication date: August 13, 2020Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jun Soo LEE, Yoshihisa Hirano, Jae Hoon Kim, Young Jin Noh, Sung Moon Park, Seung Kyu Lim, Kyeong Seok Jeong, Hyung Kyu Choi
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Patent number: 9812293Abstract: A plasma process apparatus including a process chamber defined by an outer wall and a dielectric window, the dielectric window including a first dielectric material and covering an upper portion of the outer wall, the dielectric window including a top surface facing outside of the process chamber and a bottom surface facing insider of the process chamber, the dielectric window further including at least one magnetic-field control groove at the top surface of the dielectric window, and a coil antenna over the dielectric window and configured to receive RF power, the coil antenna including an inner coil and an outer coil, the inner coil over a center of the dielectric window, the outer coil over an edge of the dielectric window and surrounding the inner coil may be provided.Type: GrantFiled: June 10, 2016Date of Patent: November 7, 2017Assignee: Samsung Electronics Co., Ltd.Inventors: Jung-hwan Um, Sung-moon Park, Dong-wook Kim
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Publication number: 20170084427Abstract: A plasma process apparatus including a process chamber defined by an outer wall and a dielectric window, the dielectric window including a first dielectric material and covering an upper portion of the outer wall, the dielectric window including a top surface facing outside of the process chamber and a bottom surface facing insider of the process chamber, the dielectric window further including at least one magnetic-field control groove at the top surface of the dielectric window, and a coil antenna over the dielectric window and configured to receive RF power, the coil antenna including an inner coil and an outer coil, the inner coil over a center of the dielectric window, the outer coil over an edge of the dielectric window and surrounding the inner coil may be provided.Type: ApplicationFiled: June 10, 2016Publication date: March 23, 2017Applicant: Samsung Electronics Co., Ltd.Inventors: Jung-hwan UM, Sung-moon PARK, Dong-wook KIM