Abstract: A plasma display panel (PDP) including: first and second opposing substrates; a discharge layer disposed between the substrates, having discharge cells; address electrodes disposed on the first substrate, extending in a first direction, across the discharge cells; and display electrodes disposed on the second substrate, extending across the discharge cells in a second direction. The discharge layer includes: a discharge enhancement layer disposed on the first substrate, having first spaces; and a barrier rib layer disposed on the discharge enhancement layer, having second spaces that are connected to the first spaces, so as to form the discharge cells. The discharge enhancement layer further includes a perimeter member disposed in a dummy area provided at the edges of an effective area of the PDP.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: A plasma display panel (PDP) including: first and second opposing substrates; a discharge layer disposed between the substrates, having discharge cells; address electrodes disposed on the first substrate, extending in a first direction, across the discharge cells; and display electrodes disposed on the second substrate, extending across the discharge cells in a second direction. The discharge layer includes: a discharge enhancement layer disposed on the first substrate, having first spaces; and a barrier rib layer disposed on the discharge enhancement layer, having second spaces that are connected to the first spaces, so as to form the discharge cells. The discharge enhancement layer further includes a perimeter member disposed in a dummy area provided at the edges of an effective area of the PDP.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.

Abstract: A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.

Abstract: The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble compound, d) a photopolymerization initiator and e) a solvent, and a photoresist dry film resists using the photoresist resins. The photoresist resin compositions and the photoresist dry film resists using the same in accordance with the invention have excellent adhesion to a substrate and sandblast resistance and at the same time, they have high sensitivity as well as high resolution, thereby enabling fine pattern formation on substrates.