Patents by Inventor Sung Ryoung Ryu

Sung Ryoung Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for manufacturing thin film transistor
    Patent number: 7932138
    Abstract: A method for manufacturing a thin film transistor with improved current characteristics and high electron mobility. According to the method, when an amorphous silicon thin film is crystallized into a polycrystalline silicon thin film by metal-induced crystallization, annealing conditions of the amorphous silicon thin film and the amount of a metal catalyst doped into the amorphous silicon thin film are optimized to reduce the regions of a metal silicide distributed at grain boundaries of the polycrystalline silicon thin film. In addition, oxygen (O2) gas or water (H2O) vapor is supplied to form a passivation film on the surface of the polycrystalline silicon thin film.
    Type: Grant
    Filed: December 22, 2008
    Date of Patent: April 26, 2011
    Assignee: Viatron Technologies Inc.
    Inventors: Hyoung June Kim, Dong Hoon Shin, Su Kyoung Lee, Jung Min Lee, Wang Jun Park, Sung Ryoung Ryu, Hoon Kim
  • METHOD FOR MANUFACTURING THIN FILM TRANSISTOR
    Publication number: 20090170248
    Abstract: A method for manufacturing a thin film transistor with improved current characteristics and high electron mobility. According to the method, when an amorphous silicon thin film is crystallized into a polycrystalline silicon thin film by metal-induced crystallization, annealing conditions of the amorphous silicon thin film and the amount of a metal catalyst doped into the amorphous silicon thin film are optimized to reduce the regions of a metal silicide distributed at grain boundaries of the polycrystalline silicon thin film. In addition, oxygen (O2) gas or water (H2O) vapor is supplied to form a passivation film on the surface of the polycrystalline silicon thin film.
    Type: Application
    Filed: December 22, 2008
    Publication date: July 2, 2009
    Inventors: Hyoung June Kim, Dong Hoon Shin, Su Kyoung Lee, Jung Min Lee, Wang Jun Park, Sung Ryoung Ryu, Hoon Kim