Patents by Inventor Sung Ryu

Sung Ryu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7294584
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: November 13, 2007
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Ki Yong Song, Joon Sung Ryu, Jong Baek Seon
  • Publication number: 20070132930
    Abstract: Disclosed is an alignment layer rubbing apparatus including a table for seating a glass substrate and a rubbing roller movably positioned on top of the table so as to rub an alignment layer of the glass substrate seated on the table. The table and the rubbing roller are tilted at a predetermined angle, and the rubbing roller is adapted to move at an angle of 0° on the table. Therefore, the damage inflicted on the alignment layer due to poor aligning of rubbing fabric attached to the rubbing roller or due to the existence of an alien substance on a surface of the rubbing roller is not concentrated, but rather spans across a region. This reduces the occurrence of rubbing stains and the visibility of damaged parts.
    Type: Application
    Filed: December 13, 2006
    Publication date: June 14, 2007
    Inventors: Sung Ryu, Hae Park
  • Publication number: 20070032458
    Abstract: Provided are a compound having an activity for inhibiting dioxin toxicity, a pharmaceutical composition including the compound and a method of treating disease resulting from dioxin toxicity using the compound. More particularly, the compound is represented by formula 1: where, R1 may be a hydrogen atom, a C1-C5 alkyl group or an alkylketone group; and R2 may be a hydrogen atom, a C1-C10 alkyl group or —COR3, wherein R3 may be a C1-C5 alkyl group, a C1-C5 alkylamide group, a C3-C12 aryl group or a heteroaryl group. A compound having an activity for inhibiting dioxin toxicity by directly antagonizing a dioxin receptor and specifically lessening dioxin-associated toxicity without an adverse effect resulting from an overdose of the compound or an outbreak of another disease can be obtained.
    Type: Application
    Filed: June 28, 2006
    Publication date: February 8, 2007
    Applicants: POSTECH FOUNDATION, POSTECH ACADEMY-INDUSTRY FOUNDATION
    Inventors: Pann Suh, Sung Ryu, Sun Kim, Yun Kim
  • Publication number: 20070010451
    Abstract: The present invention relates to a method of protecting cells against damage caused at least in part by apoptosis, comprising administering to subjects a therapeutic dose of leumorphin having cytoprotective activity, and a pharmaceutical composition comprising an effective amount of leumorphin having a cytoprotective activity.
    Type: Application
    Filed: July 6, 2006
    Publication date: January 11, 2007
    Inventors: Byoung Lee, SooMi Kim, Eun-Mi Hur, Yong-Soo Park, Yun-Hee Kim, Taehoon Lee, Kyong-Tai Kim, Pann-Ghill Suh, Sung Ryu
  • Publication number: 20060221550
    Abstract: The invention relates to a method for manufacturing dielectric ceramic powder and a multilayer ceramic capacitor using the ceramic powder. According to the invention, BaCO3 powder is dispersed into a solution of solvent and dispersant to prepare BaCO3 slurry and then the resultant BaCO3 slurry is wet-milled. Also, TiO2 powder slurry is mixed into the wet-milled BaCO3 slurry to form mixed slurry and then the mixed slurry is dried into mixed powder. Finally, the dried mixed powder is calcined to produce BaTiO3 powder.
    Type: Application
    Filed: February 14, 2006
    Publication date: October 5, 2006
    Inventors: Sung Ryu, Seon Park, Sang Lee, Dong Sinn, Sang Lee, Dang Yoon
  • Patent number: 7108922
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnecting layers of a semiconductor device.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: September 19, 2006
    Assignee: Samsung Electronic Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Ki Yong Song, Hyun Dam Jeong, Joon Sung Ryu
  • Publication number: 20060172363
    Abstract: The present invention provides peptide complexes comprising phospholipase D and one or morephospholipase D-interacting peptides. The peptide complexes are useful in screening assays foridentifying compounds effective in modulating the peptide complexes and in treating and/or preventing diseases associated with phospholipase D and it's interacting partners. In addition, methods for screening modulators of the peptide complexes or interacting members thereof are provided.
    Type: Application
    Filed: September 18, 2003
    Publication date: August 3, 2006
    Applicant: POSTECH FOUNDATION
    Inventors: Sung Ryu, Pann Suh, Jong Kim, Il Jang, Hye Lee, Young Chae, Sang Ha, Jong Park, Jung Kim, Sukmook Lee, Jun Lee, Chang Lee, Hyun Kim, Il Kim, Hyeona Jeon
  • Patent number: 7071540
    Abstract: A siloxane-based resin having a novel structure and a semiconductor interlayer insulating film using the same. The siloxane-based resins have a low dielectric constant in addition to excellent mechanical properties and are useful materials in an insulating film between interconnect layers of a semiconductor device.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: July 4, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Ki Yong Song, Joon Sung Ryu, Jong Baek Seon
  • Patent number: 7014917
    Abstract: Disclosed herein are a siloxane-based resin having novel structure and an interlayer insulating film for a semiconductor device formed using the same The siloxane-based resins have so low dielectric constant in addition to excellent mechanical properties, heat-stability and crack-resistance that they are useful materials for an insulating film between interconnect layers of a semiconductor device.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: March 21, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Joon Sung Ryu, Ki Yong Song
  • Publication number: 20060005559
    Abstract: An air conditioner is disclosed. The present invention includes a cabinet wherein an indoor air is sucked into the cabinet in a lateral direction and wherein an air-conditioned air is blown from the cabinet in a front direction, an indoor blower provided within the cabinet, the indoor blower sucking the indoor air to blow in the front direction, and at least one indoor heat exchanger provided next to the indoor blower within the cabinet to exchange heat with a flowing air. Accordingly, the present invention enhances air-conditioning performance.
    Type: Application
    Filed: June 13, 2005
    Publication date: January 12, 2006
    Applicant: LG Electronics Inc.
    Inventors: Kyoung Lim, Byeong Park, Moon Kim, Sung Ryu, Sang Baek, Yong Jung, Jung Han, Dong Han
  • Publication number: 20050274134
    Abstract: An air conditioner is disclosed. The air conditioner includes a frame having air suction holes formed at upper and opposite lateral surfaces thereof and an air discharge hole formed at a front surface thereof, a heat exchanger having upper, left and right heat exchanger portions located along the air suction holes, and a fan disposed below the heat exchanger and adapted to suction air from radial and rearward directions thereof and to blow the air in a forward direction.
    Type: Application
    Filed: June 13, 2005
    Publication date: December 15, 2005
    Inventors: Sung Ryu, Byeong Park
  • Publication number: 20040242013
    Abstract: Disclosed herein are a siloxane-based resin having novel structure and an interlayer insulating film for a semiconductor device formed using the same. The siloxane-based resins have so low dielectric constant in addition to excellent mechanical properties, heat-stability and crack-resistance that they are useful materials for an insulating film between interconnect layers of a semiconductor device.
    Type: Application
    Filed: October 30, 2003
    Publication date: December 2, 2004
    Inventors: Yi Yeol Lyu, Jin Heong Yim, Joon Sung Ryu, Ki Yong Song