Abstract: A pressure-sensitive adhesive composition for an optical film, a method of preparing a pressure-sensitive adhesive for an optical film, a polarizing plate and a liquid crystal display are provided. The pressure-sensitive adhesive composition may be effectively coated even when a coating solid content is controlled to be high. Therefore, productivity in formation of a pressure-sensitive adhesive or manufacture of an optical film such as a polarizing plate may be significantly increased, and excellent durability and reliability and re-workability may be exhibited after the pressure-sensitive adhesive is prepared.

Abstract: According to one embodiment of the present invention, an azo polymer forms a complex with a lithium ion and a sodium ion among alkali metal ions, but does not form a complex with a potassium ion. Therefore, the azo polymer is expected to be utilized as a material for a sensor capable of selectively detecting a specific alkali metal ion, or as a novel material capable of selectively trapping a specific alkali metal ion from a solution in which metal ions are mixed.

Abstract: Provided are a pressure-sensitive adhesive composition, an optical member, a polarizing plate and a display device. The pressure-sensitive adhesive composition having physical properties required for an optical member using a particular block copolymer and an antioxidant or a photostabilizer, which forms a fine phase change region in a crosslinking structure, and particularly having excellent bending preventability and storage stability may be provided. Such a pressure-sensitive adhesive composition may be used for optical uses, for example, to laminate various optical members, or apply an optical member to a display device.

Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, can be provided with a variety of required functions without constraint and, especially, etching selectivity can be secured, making the block copolymer effectively applicable to such uses as pattern formation.

Abstract: The present application provides a block copolymer and uses thereof. The block copolymer of the present application exhibits an excellent self-assembling property or phase separation property, and can be provided with a variety of required functions without constraint.

Abstract: The present application relates to a monomer, a method for preparing a block copolymer, a block copolymer, and uses thereof. Each monomer of the present application exhibits an excellent self-assembling property and is capable of forming a block copolymer to which a variety of required functions are granted as necessary without constraint.

Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

Abstract: Provided is a method of manufacturing a patterned substrate. The method may be applied to a process of manufacturing a device such as an electronic device or integrated circuit, or another use, for example, to manufacture an integrated optical system, a guidance and detection pattern of a magnetic domain memory, a flat panel display, a LCD, a thin film magnetic head or an organic light emitting diode, and used to construct a pattern on a surface to be used to manufacture a discrete tract medium such as an integrated circuit, a bit-patterned medium and/or a magnetic storage device such as a hard drive.

Abstract: The present application relates to a micelle comprising a drug encapsulated by an amphiphilic polymer and a composition comprising the same. The micelle of the present application has an excellent dispersion property on an aqueous solution and a superior percutaneous absorption characteristic on preparing a formulation.

Abstract: The present application relates to a cathode, a method of manufacturing the same, and a battery including the same. The present application may provide a cathode and a method of manufacturing the same, wherein the cathode comprises an active material layer that contains an acrylic polymer and exhibits excellent resistance to an electrolyte, excellent dispersion of its components and great adhesion to a current collector.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: Provided are a pressure-sensitive adhesive composition, a protective film, an optical device, and a display device. The pressure-sensitive adhesive composition may exhibit excellent storage stability, suitable low speed and high speed peel-off strengths after forming a crosslinking structure, and have an excellent balance between them. Accordingly, the pressure-sensitive adhesive composition may exhibit an excellent protective effect when applied to a protective film, may be easily peeled in a high speed peel-off and thus advantageous for a high speed process, and may exhibit an excellent antistatic characteristic.

Abstract: The present invention relates to a method for forming a silicon oxide nanopattern, in which the method can be used to easily form a nanodot or nanohole-type nanopattern, and a metal nanopattern formed by using the same can be properly applied to a next-generation magnetic recording medium for storage information, etc., a method for forming a metal nanopattern, and a magnetic recording medium for information storage using the same. The method for forming a silicon oxide nanopattern includes the steps of forming a block copolymer thin film including specific hard segments and soft segments containing a (meth)acrylate-based repeating unit on silicon oxide of a substrate; conducting orientation of the thin film; selectively removing the soft segments from the block copolymer thin film; and conducting reactive ion etching of silicon oxide using the block copolymer thin film from which the soft segments are removed, as a mask to form a silicon oxide nanodot or nanohole pattern.

Abstract: The present invention relates to pressure-sensitive adhesive compositions including interpenetrating polymer networks in a cured state, which comprise a multi-functional acrylate, a photo initiator and a thermal initiator; polarizers; and liquid crystal displays comprising the same. In the present invention, a pressure-sensitive adhesive composition is provided, which can prevent light-leakage phenomenon, and has excellent physical properties such as endurance under high temperature and/or high humidity conditions and workability, such as removability.

Abstract: The invention relates to an acrylic adhesive composition, more particularly, to an adhesive composition which: specifies the contents of a (meth)acrylic ester-based monomer and an aromatic group-containing monomer of an acrylic copolymer as a composition having little or no difference of birefringence; has excellent durability; and can reduce light leakage due to flexure by mixing a crosslinkable functional group-containing acrylic copolymer (A) and an acrylic copolymer (B) which does not contain the crosslinkable functional group, in a ratio of 1:9 to 5:5.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.

Abstract: The present application provides the block copolymers and their application. The block copolymer has an excellent self assembling property and phase separation and various required functions can be freely applied thereto as necessary.