Patents by Inventor Sung-su Cha

Sung-su Cha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device
    Patent number: 10090058
    Abstract: A semiconductor device may be provided. The semiconductor device may be configured for detecting a defect of a fuse set. The semiconductor device may include a pseudo initial signal generator configured to generate pseudo initial information on the basis of a test mode signal. The semiconductor device may include a fuse-set defect detector configured to compare fuse-set information of a fuse set or the pseudo initial information with a reference value on the basis of a fuse-set address, and detect a defect of the fuse set.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: October 2, 2018
    Assignee: SK hynix Inc.
    Inventors: Sung Soo Chi, Dong Woo Lyu, Jin Yo Park, Sang Kyung Shin, Kwang Soo Ahn, Sung Su Cha
  • SEMICONDUCTOR DEVICE
    Publication number: 20180082754
    Abstract: A semiconductor device may be provided. The semiconductor device may be configured for detecting a defect of a fuse set. The semiconductor device may include a pseudo initial signal generator configured to generate pseudo initial information on the basis of a test mode signal. The semiconductor device may include a fuse-set defect detector configured to compare fuse-set information of a fuse set or the pseudo initial information with a reference value on the basis of a fuse-set address, and detect a defect of the fuse set.
    Type: Application
    Filed: March 6, 2017
    Publication date: March 22, 2018
    Applicant: SK hynix Inc.
    Inventors: Sung Soo CHI, Dong Woo LYU, Jin Yo PARK, Sang Kyung SHIN, Kwang Soo AHN, Sung Su CHA
  • Alignment Film, Method of Forming the Same, and Liquid Crystal Display Including the Same
    Publication number: 20070110922
    Abstract: A method of forming the alignment film includes placing an inorganic target and a substrate in a chamber so that the inorganic target and the substrate are parallel to each other, evacuating the chamber to a first pressure, supplying a discharge gas into the chamber and evacuating the chamber to a second pressure higher than the first pressure. Moreover, the method further includes depositing an inorganic film on the substrate by ejecting inorganic particles from the inorganic target.
    Type: Application
    Filed: November 8, 2006
    Publication date: May 17, 2007
    Inventors: Soon-Joon Rho, Kyong-ok Park, Jang-sub Kim, Baek-kyun Jeon, Phil-kook Son, Jae-chang Kim, Tae-hoon Yoon, Joo-hong Seo, Sung-su Cha, Sung-Pil Lee