Patents by Inventor Sung Won SHIM

Sung Won SHIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for purifying waste N-methyl-2-pyrrolidone mixture solution
    Patent number: 12252468
    Abstract: A method for purifying a waste N-methyl-2-pyrrolidone (NMP) mixed solution according to an embodiment of the present disclosure includes using a base. The base according to an embodiment may be NaBH4. N-methylsuccinimide and ?-butyrolactone are simultaneously removed, and high-purity NMP can be recovered by applying a base to the waste NMP mixed solution.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: March 18, 2025
    Assignees: JAEWON INDUSTRIAL CO., LTD, EM TECH. CO., LTD
    Inventor: Sung Won Shim
  • METHOD FOR PREPARING A CATHODE OF A SECONDARY BATTERY AND A PURIFIED N-METHYL PYRROLIDONE, AND PURIFYING A WASTE N-METHYL PYRROLIDONE USING AN INHIBITOR
    Publication number: 20240387829
    Abstract: In a method for preparing a cathode of a secondary battery, a method for preparing a purified N-methyl pyrrolidinone (NMP), and a method for purifying a waste NMP, an inhibitor is added to prevent NMP from being decomposed to produce formaldehyde during the process. 1. The inhibitor may be a phenol-based antioxidant and/or an amine-based light stabilizer.
    Type: Application
    Filed: May 16, 2024
    Publication date: November 21, 2024
    Inventors: JAE WON SHIM, SUNG WON SHIM, BYUNG KI SON, HWAN CHOI, YOUN SOO SHIN, TAE GI CHOI, HWA YEONG CHOI, YEONG SU CHOO
  • PURIFICATION METHOD OF HIGH PURITY ISOPROPYL ALCOHOL USED IN SEMICONDUCTOR CLEANING PROCESS
    Publication number: 20230365904
    Abstract: In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in isopropyl alcohol is removed by an adsorption process, and diacetone alcohol, triisopropyl borate, and metal impurities are removed by a distillation process. The purified isopropyl alcohol may have a purity of has the moisture of 10 ppm or less, the triisopropyl boron compound of 50 ppt or less, and each metal of the metal impurities of 20 ppt or less.
    Type: Application
    Filed: May 10, 2023
    Publication date: November 16, 2023
    Inventors: Sung Won SHIM, Byung Ki SON, Yung LIM, Hwan CHOI, Youn Soo SHIN, Min Young KIM, Tae Gi CHOI
  • METHOD FOR PURIYFING WASTE N-METHYL-2-PYRROLIDONE
    Publication number: 20230192609
    Abstract: Provided is a method for purifying waste N-methyl-2-pyrrolidone, the method comprising the steps of: reacting the waste N-methyl-2-pyrrolidone containing an amine compound with an acid anhydride; converting the amine compound into an amide compound; and removing the amide compound by distillation, thereby manufacturing high-purity N-methyl-2-pyrrolidone that can be reused.
    Type: Application
    Filed: December 20, 2022
    Publication date: June 22, 2023
    Applicant: JAEWON INDUSTRIAL CO., LTD
    Inventors: Sung Won SHIM, Byung Ki SON, Hwan CHOI, Youn Soo SHIN, Hwa Yeong CHOI, Tae Gi CHOI, Yeong Su CHOO
  • METHOD FOR PURIFYING AN ALKYLENE GLYCOL MONOALKYL ETHER CARBOXYLIC ACID ESTER HAVING HIHG-PURITY USED IN PHOTO RESIST PROCESS
    Publication number: 20230095681
    Abstract: Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the method comprises the step of distillation after passing industrial AGAECE through a porous adsorbent impregnated with a basic material, and it is possible to obtain a semiconductor-grade high-purity AGAECE maintaining a low acid value and high purity according to the present invention.
    Type: Application
    Filed: September 21, 2022
    Publication date: March 30, 2023
    Applicant: JAEWON INDUSTRIAL CO., LTD
    Inventors: Sung Won SHIM, Byung Ki SON, Hwan CHOI, Youn Soo SHIN, Hwa Yeong CHOI, Ho JEONG
  • METHOD FOR PURIFYING WASTE N-METHYL-2-PYRROLIDONE MIXTURE SOLUTION
    Publication number: 20220144772
    Abstract: A method for purifying a waste N-methyl-2-pyrrolidone (NMP) mixed solution according to an embodiment of the present disclosure includes using a base. The base according to an embodiment may be NaBH4. N-methylsuccinimide and ?-butyrolactone are simultaneously removed, and high-purity NMP can be recovered by applying a base to the waste NMP mixed solution.
    Type: Application
    Filed: July 7, 2020
    Publication date: May 12, 2022
    Inventor: Sung Won SHIM