Patents by Inventor Sung Woo Hong

Sung Woo Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11692055
    Abstract: The present disclosure relates to a composition for forming a polyurethane film, a polyurethane film derived from the composition and an article comprising a substrate and the polyurethane film, and the composition for forming a polyurethane film comprises an OH group-containing polymer; a curing agent; and an amphoteric ion-based polymer.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: July 4, 2023
    Assignee: Korea Institute of Industrial Technology
    Inventors: Sung Woo Hong, Sung Koo Lee, Pyong Hwa Hong, Gyeong Min Moon, Jin Sil Kim
  • Publication number: 20230040783
    Abstract: The present disclosure relates to an apparatus and method for controlling an autonomous vehicle to allow an autonomous vehicle to safely pass through a road according to a driver's choice when the width of the road is narrow. The apparatus includes a sensor for acquiring information data of obstacles and vehicles in front of and on a side of a host vehicle, a signal processor for outputting data with respect to positions and media of obstacles and a determination signal representing presence or absence of a vehicle on a driving path, a controller for determining whether driving is possible by analyzing information acquired by the sensor and outputting a control signal corresponding to a selection signal of the driver, an interface for displaying an image processed by the signal processor, and an autonomous driving function unit for performing autonomous driving according to the control signal.
    Type: Application
    Filed: July 1, 2022
    Publication date: February 9, 2023
    Applicants: Hyundai Motor Company, KIA CORPORATION
    Inventors: Jun Hyuk Choi, Sung Woo Hong, Nam Young Oh, Tae Sung Kim, Hwan Soo Moon
  • Patent number: 11535693
    Abstract: Disclosed is a composition for forming a polyurethane film with improved reaction stability, comprising an OH group-containing polymer; an isocyanate-based compound as a curing agent; and an alicyclic urea diol compound having two urea groups and an OH group at two terminals, and a polyurethane film with improved self-healable property from tear, derived from the composition.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: December 27, 2022
    Assignee: Korea Institute of Industrial Technology
    Inventors: Sung Woo Hong, Sung Koo Lee, Pyong Hwa Hong, Jin Sil Kim, Gyeong Min Moon, Kiseung Kim
  • Publication number: 20210155733
    Abstract: The present disclosure relates to a composition for forming a polyurethane film, a polyurethane film derived from the composition and an article comprising a substrate and the polyurethane film, and the composition for forming a polyurethane film comprises an OH group-containing polymer; a curing agent; and an amphoteric ion-based polymer.
    Type: Application
    Filed: November 24, 2020
    Publication date: May 27, 2021
    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
    Inventors: Sung Woo HONG, Sung Koo LEE, Pyong Hwa HONG, Gyeong Min MOON, Jin Sil KIM
  • Publication number: 20210155739
    Abstract: Disclosed is a composition for forming a polyurethane film with improved reaction stability, comprising an OH group-containing polymer; an isocyanate-based compound as a curing agent; and an alicyclic urea diol compound having two urea groups and an OH group at two terminals, and a polyurethane film with improved self-healable property from tear, derived from the composition.
    Type: Application
    Filed: November 23, 2020
    Publication date: May 27, 2021
    Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
    Inventors: Sung Woo HONG, Sung Koo LEE, Pyong Hwa HONG, Jin Sil KIM, Gyeong Min MOON, Kiseung KIM
  • Patent number: 10858482
    Abstract: A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: December 8, 2020
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Sung Woo Hong, Byung-hee Sohn, Sun Jin Song, Chanjae Ahn, Kyeong-sik Ju, Sungwon Choi
  • Publication number: 20200223983
    Abstract: A poly(imide-amide) copolymer, which is a product of a reaction between a diamine including an amide structural unit-containing oligomer represented by Chemical Formula 1 and a dianhydride represented by Chemical Formula 3: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.
    Type: Application
    Filed: April 1, 2020
    Publication date: July 16, 2020
    Inventors: Sung Woo HONG, Chanjae AHN, Hyunjeong JEON, Sang Soo JEE, Hongkyoon CHOI, Byunghee SOHN, Sungwon CHOI
  • Patent number: 10240002
    Abstract: A poly(imide-amide) copolymer including a structural unit represented by Chemical Formula 1; a structural unit represented by Chemical Formula 2; and any one of a structural unit represented by Chemical Formula 3, an amic acid precursor of the structural unit represented by Chemical Formula 3, and a combination thereof; wherein a cured material of the poly(imide-amide) copolymer may have a tensile modulus of greater than or equal to about 5.5 GPa, and a yellowness index of less than or equal to about 5: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: March 26, 2019
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Hongkyoon Choi, Chanjae Ahn, Hyunjeong Jeon, Sang Soo Jee, Sungwon Choi, Sung Woo Hong, Byunghee Sohn
  • Publication number: 20170267821
    Abstract: A method of producing a polyimide film, including obtaining a polyamic acid including a repeating unit of Chemical Formula 1: wherein Ar1 and Ar2 are described in the specification; imidizing the polyamic acid to obtain a partially imidized polyimide; determining a sub-Tg temperature of the partially imidized polyimide; and heating the partially imidized polyimide in at least two steps to obtain a polyimide film, wherein a step transition temperature range is within the sub-Tg temperature ±30° C.
    Type: Application
    Filed: April 5, 2017
    Publication date: September 21, 2017
    Inventors: Sung Won CHOI, Chan Jae AHN, Sung Woo HONG, Won Suk CHANG, A Ra JO
  • Publication number: 20170246773
    Abstract: A method of preparing an optical film, preparing a coating composition including an amic acid-containing polymer represented by Chemical Formula 1 and at least one polymerization aid selected from an alkyl phosphite, an aryl phosphite, an alkyl phosphate, and an aryl phosphate; providing the coating composition on a substrate to form a coating layer; and applying heat to the coating layer to prepare a cured film: wherein, in Chemical Formula 1, are the same or different in each repeating unit, and are each independently at least one selected from an aromatic organic group, an aliphatic organic group, and an alicyclic organic group, and 0?x?1.
    Type: Application
    Filed: May 15, 2017
    Publication date: August 31, 2017
    Inventors: Sung Woo HONG, Woo-Jin BAE, Chan Jae AHN, Won Suk CHANG, A ra JO, Sung Won CHOI
  • Patent number: 9718094
    Abstract: A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: August 1, 2017
    Assignees: UNIST ACADEMY-INDUSTRY, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE UNIVERSITY OF MASSACHUSETTS
    Inventors: Thomas P. Russell, Sung Woo Hong, Dong Hyun Lee, Soojin Park, Ting Xu
  • Patent number: 9657345
    Abstract: Provided is a dual-hybridization polynucleotide including a first complementary region that is complementary to the 3?-terminus of a target nucleic and a second complementary region that is complementary to the 5?-terminus of the target nucleic acid, a composition and kit including the polynucleotide, and a method of producing a nucleotide sequence complementary to the target nucleic acid. The first complementary region to be bound at the 3?-terminus of the target nucleic acid can be shortened and the target nucleic acid may be amplified with excellent specificity and/or sensitivity.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: May 23, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dong-hyun Park, Sung-woo Hong, Kyung-hee Park, Myo-yong Lee
  • Patent number: 9649791
    Abstract: A method of preparing an optical film, preparing a coating composition including an amic acid-containing polymer represented by Chemical Formula 1 and at least one polymerization aid selected from an alkyl phosphite, an aryl phosphite, an alkyl phosphate, and an aryl phosphate; providing the coating composition on a substrate to form a coating layer; and applying heat to the coating layer to prepare a cured film: wherein, in Chemical Formula 1, are the same or different in each repeating unit, and are each independently at least one selected from an aromatic organic group, an aliphatic organic group, and an alicyclic organic group, and 0?x?1.
    Type: Grant
    Filed: April 14, 2014
    Date of Patent: May 16, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung Woo Hong, Woo-Jin Bae, Chan Jae Ahn, Won Suk Chang, A ra Jo, Sung Won Choi
  • Publication number: 20170130004
    Abstract: A poly(imide-amide) copolymer including a structural unit represented by Chemical Formula 1; a structural unit represented by Chemical Formula 2; and any one of a structural unit represented by Chemical Formula 3, an amic acid precursor of the structural unit represented by Chemical Formula 3, and a combination thererof; wherein a cured material of the poly(imide-amide) copolymer may have a tensile modulus of greater than or equal to about 5.5 GPa, and a yellowness index of less than or equal to about 5: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.
    Type: Application
    Filed: November 9, 2016
    Publication date: May 11, 2017
    Inventors: Hongkyoon CHOI, Chanjae AHN, Hyunjeong JEON, Sang Soo JEE, Sungwon CHOI, Sung Woo HONG, Byunghee SOHN
  • Publication number: 20170121460
    Abstract: A poly(imide-amide) copolymer, which is a product of a reaction between a diamine including an amide structural unit-containing oligomer represented by Chemical Formula 1 and a dianhydride represented by Chemical Formula 3: wherein, groups and variables in Chemical Formulae 1 and 3 are the same as described in the specification.
    Type: Application
    Filed: November 2, 2016
    Publication date: May 4, 2017
    Inventors: Sung Woo HONG, Chanjae AHN, Hyunjeong JEON, Sang Soo JEE, Hongkyoon CHOI, Byunghee SOHN, Sungwon CHOI
  • Publication number: 20170106636
    Abstract: A window for a display device including: a plastic substrate including a poly(imide-amide) copolymer, which is a reaction product of a reagent combination of 4,4?-hexafluoroisopropylidene diphthalic anhydride, 3,3?,4,4?-biphenyltetracarboxylic dianhydride, 2,2?-bis-trifluoromethyl-4,4?-biphenyldiamine, and terephthaloyl chloride, and a hard coating layer disposed on at least one side of the plastic substrate, wherein the plastic substrate has pencil scratch hardness of greater than or equal to 3H when measured according to an ASTM D3363 standard at a vertical load of about 0.5 kilograms, and a peak intensity ratio A2/A1 of a peak intensity A2 at a position of about 23.5° in 2? to a peak intensity A1 at a position of about 15.5° in 2? of an X-ray diffraction spectrum is greater than or equal to about 0.8.
    Type: Application
    Filed: July 18, 2016
    Publication date: April 20, 2017
    Inventors: A Ra JO, Chanjae AHN, Sungwon CHOI, Byunghee SOHN, Seung Bum Joseph CHUN, Sung Woo HONG, Junghwa KIM, Da Eun YU
  • Patent number: 9434098
    Abstract: A slot die includes a material distribution chamber configured to distribute a casting solution supplied to the material distribution chamber, and a lip in which a slot including an expansion portion is defined and through which the casting solution distributed in the material distribution chamber is discharged, where a width of the expansion portion taken in a first direction is expanded from one side of the expansion portion to a lip end facing the one side and the one side of the expansion portion is apart from the lip end by a predetermined length taken along a second direction which is perpendicular to the first direction and substantially parallel to a flow direction of the casting solution.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: September 6, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung Won Choi, Jae Wook Nam, Byung Hee Sohn, Sun Jin Song, Chan Jae Ahn, Semi Lee, Sung Woo Hong
  • Publication number: 20160237214
    Abstract: A composition for preparing poly(imide-benzoxazole) copolymer is described, where the copolymer include: a tetracarboxylic acid dianhydride represented by Chemical Formula 1, a diamine represented by Chemical Formula 2, and a diamine represented by Chemical Formula 3: wherein definitions of groups and variables in Chemical Formulae 1 to 3 are the same as described in the specification.
    Type: Application
    Filed: October 9, 2015
    Publication date: August 18, 2016
    Inventors: Sung Woo HONG, Byung-hee SOHN, Sun Jin SONG, Chanjae AHN, Kyeong-sik JU, Sungwon CHOI
  • Patent number: 9382387
    Abstract: The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: July 5, 2016
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Yan Xia, Benjamin R Sveinbjornsson, Robert H Grubbs, Raymond Weitekamp, Garret M Miyake, Harry A Atwater, Victoria Piunova, Christopher Scot Daeffler, Sung Woo Hong, Weiyin Gu, Thomas P. Russell
  • Patent number: 9238751
    Abstract: A polyimide precursor composition, including a polyamic acid including a repeating unit represented by Chemical Formula 1 and transparent metal oxide nanoparticles coordinated to a ligand represented by RCOOH, wherein R is a linear or branched C1-C4 alkyl or a linear or branched C2-C4 alkenyl: wherein variables Cy, A3, R31, and n34 in Chemical Formula I are described in the specification.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: January 19, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Woo-Jin Bae, Sung Woo Hong, Byung Hee Sohn, Won Suk Chang