Patents by Inventor Sung Yong Moon

Sung Yong Moon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240321580
    Abstract: A photomask manufacturing method includes defining a main region and a dummy region based on a layout data, wherein the main region corresponds to an outer boundary surrounding functional patterns defined by the layout data and the dummy region corresponds to an empty space outside the main region, and forming a dummy pattern to fill the dummy region. The forming of the dummy pattern includes placing at least one first pattern block in the dummy region to form a first sub-region, each of the at least one first pattern block having a first area, and placing, after completing the placing of the at least one first pattern block in the dummy region, at least one second pattern block in the dummy region except the first sub-region to form a second sub-region, each of the at least one second pattern block having a second area smaller than the first area.
    Type: Application
    Filed: December 1, 2023
    Publication date: September 26, 2024
    Inventors: Dong Jin PARK, Sung-Yong MOON, Jun Young JANG
  • Publication number: 20240125990
    Abstract: The provided is an optical filter for its use. In the present invention, it is possible to provide an optical filter that effectively blocks ultraviolet ray and infrared ray and exhibits high transmittance in visible light. Furthermore, it is possible to provide an optical filter where the transmission characteristics are stably maintained even when an incident angle is changed. Moreover, it is possible to provide an optical filter that does not exhibit problems such as ripple and petal flare, and thus to provide the optical filter with excellent durability.
    Type: Application
    Filed: October 2, 2023
    Publication date: April 18, 2024
    Inventors: Joon Ho JUNG, Seon Ho YANG, Sung Min HWANG, Choon Woo JI, Sung Yong MOON
  • Publication number: 20230244136
    Abstract: A method for fabricating a photomask layout is provided. The method includes: receiving a first layout including a main pattern; generating a second layout by generating an assist feature in consideration of optical properties of the main pattern in the first layout; generating a third layout by performing optical proximity correction (OPC) on a second layout; and outputting the third layout to a corrected layout when the assist feature is not generated on an ACI image of a semiconductor film etched by using a photomask generated using the third layout, as an etching mask.
    Type: Application
    Filed: October 11, 2022
    Publication date: August 3, 2023
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Sung-Yong MOON, Won-Chan LEE
  • Patent number: 10620547
    Abstract: A method for correcting a mask layout includes providing a mask layout including first patterns, each of the first patterns having a size related to a first critical dimension (CD) value, obtaining topography data on a region of a wafer, generating a defocus map using the topography data, and correcting the mask layout on the basis of the defocus map. The generating of the defocus map includes respectively setting second CD values for a plurality of sub-regions of the mask layout. The second CD values may be set based on the topography data. The correcting of the mask layout on the basis of the defocus map comprises correcting the sizes of the first patterns to be related to the second CD values.
    Type: Grant
    Filed: July 9, 2018
    Date of Patent: April 14, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Yong Moon, Sooryong Lee, Changhwan Kim
  • Publication number: 20190155169
    Abstract: A method for correcting a mask layout includes providing a mask layout including first patterns, each of the first patterns having a size related to a first critical dimension (CD) value, obtaining topography data on a region of a wafer, generating a defocus map using the topography data, and correcting the mask layout on the basis of the defocus map. The generating of the defocus map includes respectively setting second CD values for a plurality of sub-regions of the mask layout. The second CD values may be set based on the topography data. The correcting of the mask layout on the basis of the defocus map comprises correcting the sizes of the first patterns to be related to the second CD values.
    Type: Application
    Filed: July 9, 2018
    Publication date: May 23, 2019
    Inventors: Sung-Yong MOON, SOORYONG LEE, CHANGHWAN KIM
  • Publication number: 20130100029
    Abstract: A method of providing an English letter keypad and a mobile device having the same are provided. The method of providing an English letter keypad of the present disclosure includes generating an English letter keypad, displaying the generated English letter keypad, and receiving an input of a user manipulation using the displayed English letter keypad, and English letters having high use frequencies are placed on the English letter keypad first, and English letters having low use frequencies are placed on the English letter keypad later. By the above, it is possible to significantly reduce the number of typing for inputting English letters, increasing English typing speed and user convenience.
    Type: Application
    Filed: June 16, 2011
    Publication date: April 25, 2013
    Inventor: Sung Yong Moon