Patents by Inventor Sung-Hun KEY

Sung-Hun KEY has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210066656
    Abstract: A display device includes a substrate, a light-emitting element layer disposed on the substrate, a first encapsulation layer and a second encapsulation layer which are disposed on the light-emitting element layer, and a buffer layer which covers the first encapsulation layer and the second encapsulation layer. The second encapsulation layer includes a first film, a second film disposed on the first film, and a third film disposed between the first film and the second film, and a side surface of the third film is disposed more inward than a side surface of the first film and a side surface of the second film.
    Type: Application
    Filed: August 5, 2020
    Publication date: March 4, 2021
    Inventors: Hyun KIM, Sun Ho KIM, Sun Hee LEE, Sung Hun KEY, Choel Min JANG
  • Publication number: 20170002468
    Abstract: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.
    Type: Application
    Filed: February 22, 2016
    Publication date: January 5, 2017
    Inventors: Jai Hyuk CHOI, Won Woong PARK, Sung Hun KEY, Min Soo KIM, Byeong Chun LEE, Suk Won JUNG, Hyun Woo JOO, Myung Soo HUH
  • Publication number: 20150050421
    Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.
    Type: Application
    Filed: June 4, 2014
    Publication date: February 19, 2015
    Inventors: Choel-Min JANG, Sung-Hun KEY, In-Kyo KIM, Suk-Won JUNG, Myung-Soo HUH
  • Publication number: 20140113395
    Abstract: A vapor deposition apparatus for depositing a thin film on a substrate includes a cover having an accommodation portion and a communicated portion, which communicated portion is connected to the accommodation portion and faces a direction of the substrate, and includes a body in the accommodation portion, which body includes a first portion and a second portion. The first portion is disposed at a first location of the body and connected to a first injection portion for injecting a first material onto the substrate, the second portion is disposed at a second location of the body and connected to a second injection portion for injecting a second material onto the substrate, and the body rotates in at least one direction so that the first portion and the second portion are alternately connected to each other with respect to the communicated portion.
    Type: Application
    Filed: March 12, 2013
    Publication date: April 24, 2014
    Inventors: In-Kyo KIM, Myung-Soo HUH, Suk-Won JUNG, Cheol-Min JANG, Jae-Hyun KIM, Jin-Kwang KIM, Chang-Woo SHIM, Sung-Hun KEY
  • Publication number: 20140041590
    Abstract: A canister includes an accommodation portion for accommodating a liquid material; an outlet pipe that is connected to the accommodation portion so as to discharge a gas material obtained by vaporizing the liquid material; a blocking cover that is connected to an upper surface of the accommodation portion; and a plurality of baffle plates that are disposed in the accommodation portion and are spaced apart from each other. The canister further includes a restrictor including a main body member that is disposed between the plurality of baffle plates and the blocking cover and is connected to an internal surface of the accommodation portion, an extension member extending from the main body member, and a through portion that is formed through the main body member and the extension member. A deposition procedure using the canister is efficiently performed and characteristics of a deposition layer are easily improved.
    Type: Application
    Filed: December 10, 2012
    Publication date: February 13, 2014
    Applicant: SAMSUNG DISPLAY CO., LTD.
    Inventors: Choel-Min JANG, Myung-Soo HUH, Suk-Won JUNG, Sung-Yong LEE, Cheol-Rae Jo, In-Kyo KIM, Sung-Hun KEY