Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a chamber comprising a support, the support configured to have mounted thereon a substrate; at least one channel disposed in the chamber and into which a conductive fluid or a non-conductive fluid is configured to be injected; and a control unit. The control unit includes a first pump and a second pump configured to respectively supply the conductive fluid and the non-conductive fluid to the at least one channel; and a first valve configured to receive the conductive fluid and the non-conductive fluid from the first pump and the second pump, respectively, and control proportions at which the conductive fluid and the non-conductive fluid are injected into the at least one channel.

Abstract: A substrate processing apparatus is provided. The substrate processing apparatus includes a chamber comprising a support, the support configured to have mounted thereon a substrate; at least one channel disposed in the chamber and into which a conductive fluid or a non-conductive fluid is configured to be injected; and a control unit. The control unit includes a first pump and a second pump configured to respectively supply the conductive fluid and the non-conductive fluid to the at least one channel; and a first valve configured to receive the conductive fluid and the non-conductive fluid from the first pump and the second pump, respectively, and control proportions at which the conductive fluid and the non-conductive fluid are injected into the at least one channel.

Abstract: A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a driving unit disposed between the body and mask stage. A holographic exposure apparatus may include an object supported by a substrate stage, a holographic mask spaced apart from the object and supported by a mask stage, a main body supported by the mask stage, and a driving unit disposed between the mask stage and body to control a gap between the mask stage and body. A holographic exposure apparatus may include a main body, a mask stage supported by the body, a holographic mask supported by the mask stage, and a piezoelectric element disposed between the body and mask stage. The body may include a support arm that supports the element. The mask stage may include a seat arm that supports the element.

Abstract: A holographic exposure apparatus may include an object to be exposed, a holographic mask on which a pattern to be transferred onto the object is formed, a stage to support the mask, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the stage. A holographic exposure apparatus also may include an object to be exposed, a mask spaced apart from the object, a holder that holds the mask, and a stage on which the holder is movably mounted such that a gap between the mask and object is adjusted. In addition, a holographic exposure apparatus may include a stage, a prism supported by the stage, a mask spaced apart from the prism and supported by the stage, and a gap adjustment unit disposed between the mask and stage in order to move the mask relative to the prism.