Patents by Inventor Sung-Il Jo

Sung-Il Jo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming align key in well structure formation process and method of forming element isolation structure using the align key
    Publication number: 20070037359
    Abstract: A method of forming an align key in a well structure formation process is provided. The method includes: providing a semiconductor substrate having an align key region and a first well region and forming a first ion implantation mask on the substrate. The first ion implantation mask has a groove exposing a portion of the align key region and covering the first well region. The method further includes etching the exposed align key region and the first ion implantation mask of the first well region to form a trench type align key in the align key region and a second ion implantation mask exposing the first well region, and implanting impurities into the first well region exposed by the second ion implantation mask to form a first well in the first well region.
    Type: Application
    Filed: August 14, 2006
    Publication date: February 15, 2007
    Applicant: Samsung Electronics Co., LTD.
    Inventor: Sung-Il Jo