Patents by Inventor Sungoh PARK

Sungoh PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • WEARABLE DEVICE FOR PROVIDING INFORMATION ABOUT AN APPLICATION THROUGH AN EXTERNAL DISPLAY AND METHOD OF CONTROLLING THE WEARABLE DEVICE
    Publication number: 20240094971
    Abstract: Provided is a wearable device that includes: a first display provided on a first surface of the wearable device configured to face a face of a user wearing the wearable device, and a second display provided on a second surface of the wearable device configured to face an external environment of the wearable device when the wearable device is worn by the user. The wearable device may be configured to display a first execution screen of a first application on the first display, while the wearable device is worn by the user, determine a display type for information to be displayed on the second display, while displaying the first execution screen on the first display, and display information related to the first execution screen on the second display based on the display type.
    Type: Application
    Filed: September 14, 2023
    Publication date: March 21, 2024
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sungoh KIM, Choelmin PARK, Jaeyung YEO, Chungwan HONG
  • METHOD FOR DISPLAYING BACKGROUND IMAGE THROUGH FLEXIBLE DISPLAY, AND ELECTRONIC DEVICE THEREFOR
    Publication number: 20240069601
    Abstract: An electronic device is provided. The electronic device includes a flexible display divided into a first face and a second face with respect to a folding axis, and at least one processor operatively coupled to the display. The at least one processor is configured to display main content through a first area of the display, detect folding of the display while the main content is displayed, display the main content through a second area smaller than the first area, based on a folding angle of the display and a positional relationship between the electronic device and a user, and display background content in a third area which is an area excluding the second area. The background content is an image for filling a margin produced by displaying the main content in the second area.
    Type: Application
    Filed: November 6, 2023
    Publication date: February 29, 2024
    Inventors: Bosung KIM, Yilee SEO, Jaemin JOO, Sungoh KIM, Jiyoon PARK
  • Etching composition
    Patent number: 9677002
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: June 13, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang Won Bae, Yongsun Ko, Byoungho Kwon, Bo yun Kim, Hongjin Kim, Sungoh Park, Kuntack Lee, Hyosan Lee, Sol Han
  • ETCHING COMPOSITION
    Publication number: 20160032185
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Application
    Filed: October 9, 2015
    Publication date: February 4, 2016
    Inventors: Sang Won BAE, Yongsun KO, Byoungho KWON, Bo yun KIM, Hongjin KIM, Sungoh PARK, Kuntack LEE, Hyosan LEE, Sol HAN
  • Etching composition and method of manufacturing semiconductor device using the same
    Patent number: 9165759
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: October 20, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Won Bae, Yongsun Ko, Byoungho Kwon, Bo yun Kim, Hongjin Kim, Sungoh Park, Kuntack Lee, Hyosan Lee, Sol Han
  • ETCHING COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
    Publication number: 20140141616
    Abstract: An etching composition includes about 1 wt % to about 7 wt % of hydrogen peroxide, about 20 wt % to about 80 wt % of phosphoric acid, about 0.001 wt % to about 1 wt % of an amine or amide polymer, 0 wt % to about 55 wt % of sulfuric acid, and about 10 wt % to about 45 wt % of deionized water.
    Type: Application
    Filed: November 21, 2013
    Publication date: May 22, 2014
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang Won BAE, Yongsun KO, Byoungho KWON, Bo yun KIM, Hongjin KIM, Sungoh PARK, Kuntack LEE, Hyosan LEE, Sol HAN