Abstract: A display device is disclosed that includes a substrate, a semiconductor layer, a first conductive layer, and a first gate insulating layer. The semiconductor layer is disposed on the substrate and includes a first area and a second area. The first conductive layer is disposed on the semiconductor layer and includes a first gate pattern overlapping the first area and a second gate pattern overlapping the second area. The first gate insulating layer is disposed between the semiconductor layer and the first conductive layer and includes a first insulating layer overlapping the first area and the second area, a second insulating layer overlapping the first area and the second area, and a third insulating layer not overlapping the first area but overlapping the second area. The second insulating layer is disposed between the first insulating layer and the third insulating layer, and has a dielectric constant greater than that of the third insulating layer.

Abstract: A deposition mask includes a silicon substrate including cell areas and a mask frame area excluding the cell areas, the mask frame area including a mask rip area partitioning the cell areas and an outer frame area disposed at an outermost portion of the silicon substrate, a mask rip disposed in the mask rip area, a mask membrane disposed in each of the cell areas, a first metal frame disposed in the outer frame area, and a second metal frame surrounding an outer portion of the silicon substrate and connected to the first metal frame.

Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

Abstract: A method for manufacturing a deposition mask includes depositing a seed metal layer on a front surface of a silicon substrate, forming a first photoresist pattern defining first openings on the seed metal layer, growing a plating layer in the first openings of the first photoresist pattern, forming a mask membrane by removing the first photoresist pattern and leaving the plating layer, depositing a protection layer to cover a front surface of the mask membrane, forming a second photoresist pattern defining cell opening corresponding to unit masks, respectively, on a back surface of the silicon substrate, exposing the seed metal layer by etching the back surface of the silicon substrate using the second photoresist pattern as a mask, exposing a back surface of the mask membrane by etching the seed metal layer using the second photoresist pattern as a mask, and removing the protection layer.

Abstract: A deposition mask includes a mask body including a silicon substrate, where a plurality of holes is defined through the mask body, and the mask body further includes mask grids extending to define the holes. A cross section of each mask grid has a reverse tapered shape having a width increasing from a back surface to an upper surface of the deposition mask, and each side surface of each mask grid defining a hole includes a first concave curved surface.

Abstract: A method for searching a content includes receiving a predefined user input with respect to a text region; extracting, in response to the predefined user input, at least one word from the text region; creating a search condition based on the extracted at least one word; and displaying a list of contents searched based on the created search condition.

Abstract: A deposition mask, method for manufacturing the same, and display device manufactured using the same. The deposition mask includes a mask substrate including an opening, and a mask pattern disposed on the mask substrate and including multiple hole patterns spaced apart from each other, wherein the mask pattern includes a first portion on the mask substrate, and a second portion protruding from the first portion in a direction opposite to the mask substrate, the second portion includes a first protruding portion and a second protruding portion disposed to be adjacent to the hole patterns, and a recessed portion disposed between the first protruding portion and the second protruding portion, and a height of the recessed portion may be smaller than heights of the first protruding portion and the second protruding portion.

Abstract: A display device includes a display panel including a main portion, a first bent portion and a second bent portion each extending from the main portion, and a corner portion which connects the first bent portion and the second bent portion to each other and is bendable relative to the main portion. The corner portion which is bendable includes a plurality of protrusion patterns partially disconnected from each other and each bendable relative to the main portion, and each of the plurality of protrusion patterns including a display pixel.

Abstract: A shift-by-wire transmission system includes a body provided with a sensor therein; an operation portion assembly in which a magnet is provided within a detecting range of the sensor, wherein a gear shifting operation portion is rotated about an axis of the body so that the magnet is rotated with the gear shifting operation portion, and the gear shifting operation portion is moved in an axial direction of the body so that the magnet is linearly moved together with the gear shifting operation portion; and a controller configured to detect a variation in magnetic force of the magnet detected by the sensor according to a rotational displacement and a movement displacement of the magnet and detect a gear shifting signal corresponding to a gear shifting operation of the gear shifting operation portion.

Abstract: A shift-by-wire transmission system includes a gear shifting operation portion provided at an end portion of a body and configured to shift a gear, a housing provided inside the body, a haptic element provided in contact with the housing and configured to generate a vibration when the gear is shifted to a predetermined gear shifting stage to transmit the vibration to the housing, and a groove member coupled to the gear shifting operation portion and configured to operate in conjunction with a gear shifting operation of the gear shifting operation portion and transmit the vibration of the haptic element, which is transmitted to the housing, to the gear shifting operation portion by constantly maintaining a state in contact with the housing.

Abstract: A touch detection device includes a panel including a plurality of electrodes regularly arranged in rows and columns, a connector configured to electrically connect some of the electrodes to form a plurality of sensing channels, and a driver configured to provide driving signals to the sensing channels, wherein the driver parts different edges of the driving signals to different sensing channels.

Abstract: A display device includes a plurality of pixel electrodes on a substrate, light-emitting elements on the plurality of pixel electrodes and extending in a thickness direction of the substrate and connecting electrodes between the plurality of pixel electrodes and the light-emitting elements, wherein a width of the connecting electrodes is greater than a width of the light-emitting elements, and upper corners of each of the light-emitting elements and upper corners of each of the connecting electrodes are rounded.

Abstract: The disclosure provides a display device and a method of manufacturing the same. The display device includes a plurality of pixel circuit parts disposed on a substrate, a plurality of pixel electrodes, each disposed on the pixel circuit parts, a first insulating layer filling a space between the pixel electrodes, a plurality of light emitting elements, each disposed on the pixel electrodes, and connection electrodes disposed between the light emitting elements and the pixel electrodes. Each of the pixel electrodes includes a protrusion protruding toward a corresponding one of the connection electrodes.

Abstract: A display device includes: a substrate; pixel electrodes on the substrate; light emitting elements on the pixel electrodes and extending in a thickness direction of the substrate; a first insulating layer extending around sides of the light emitting element; and a connection electrode between one of the pixel electrodes and a corresponding one of the light emitting elements. The connection electrode includes: a connection portion bonding the pixel electrode to the light emitting element; and a reflection portion integral with the connection portion and extending around the sides of the light emitting element on the first insulating layer.

Abstract: A method for searching a content includes receiving a predefined user input with respect to a text region; extracting, in response to the predefined user input, at least one word from the text region; creating a search condition based on the extracted at least one word; and displaying a list of contents searched based on the created search condition.

Abstract: A semiconductor memory device and a method for fabricating a semiconductor memory device, the device including a peripheral logic structure on a substrate; a horizontal conductive substrate on the peripheral logic structure; a stacked structure including a plurality of electrode pads stacked in a vertical direction; a plate contact plug connected to the horizontal conductive substrate; and a first penetration electrode connected to the lower connection wiring body, wherein upper surfaces of the plate contact plug and the first penetration electrode are on a same plane, the plate contact plug includes an upper part and a lower part directly connected to each other, the first penetration electrode includes an upper part and a lower part directly connected to each other, moving away from upper surfaces of the first penetration electrode and the plate contact plug, widths of the upper parts increase and widths of the lower parts decrease.

Abstract: A method for etching an insulating layer includes: sequentially forming a first gate insulating layer, an amorphous silicon layer, a first interlayer insulating layer, and a second interlayer insulating layer on a substrate; applying a photoresist on the second interlayer insulating layer, and patterning the photoresist through a photo-process; first etching the second interlayer insulating layer and the first interlayer insulating layer until at least a portion of the amorphous silicon layer is exposed by using the patterned photoresist as a mask; second etching the second interlayer insulating layer and the first interlayer insulating layer; third etching the amorphous silicon layer; and fourth etching the first gate insulating layer, wherein an etching gas used in the second etching includes a material having a higher etching selection ratio of the first and second interlayer insulating layers to the amorphous silicon layer than an etching gas used in the first etching.

Abstract: A display device includes a thin film transistor on a base substrate and a signal wiring electrically connected to the thin film transistor. The signal wiring includes a main conductive layer including copper, and a capping layer including titanium the capping layer overlapping a portion of an upper surface of the main conductive layer. The signal wiring has a taper angle in a range of about 70° to about 90°. A thickness of the capping layer is in a range of about 100 ? to about 300 ?, and a thickness of the main conductive layer is in a range of about 1,000 ? to about 20,000 ?.

Abstract: A semiconductor memory device and a method for fabricating a semiconductor memory device, the device including a peripheral logic structure on a substrate; a horizontal conductive substrate on the peripheral logic structure; a stacked structure including a plurality of electrode pads stacked in a vertical direction; a plate contact plug connected to the horizontal conductive substrate; and a first penetration electrode connected to the lower connection wiring body, wherein upper surfaces of the plate contact plug and the first penetration electrode are on a same plane, the plate contact plug includes an upper part and a lower part directly connected to each other, the first penetration electrode includes an upper part and a lower part directly connected to each other, moving away from upper surfaces of the first penetration electrode and the plate contact plug, widths of the upper parts increase and widths of the lower parts decrease.

Abstract: A display device includes the following elements: a semiconductor layer positioned on a substrate; a first gate insulating layer positioned on the semiconductor layer; a first gate conductive layer positioned on the first gate insulating layer; a second gate insulating layer positioned on the first gate conductive layer; a second gate conductive layer positioned on the second gate insulating layer; a first insulating layer positioned on the second gate conductive layer; a first contact hole passing through the first insulating layer, the second gate insulating layer, and the first gate insulating layer; a second contact hole passing through the first insulating layer; and a third contact hole passing through the first insulating layer and the second gate insulating layer. A cross-section of the first insulating layer in a plane perpendicular to the substrate has a curved profile.