Abstract: A mask includes a first frame, where first openings are defined through the first frame, and second frames respectively arranged in the first openings, where second openings smaller than the first openings are defined through each of the second frames. The first frame includes a (1-1)th frame portion and a (1-2)th frame portion arranged on the (1-1)th frame portion, and each of the second frames includes a (2-1)th frame portion in a lattice pattern and a (2-2)th frame portion arranged on the (2-1)th frame portion. The (1-1)th frame portion and the (2-1)th frame portion include a first material, and the (1-2)th frame portion and the (2-2)th frame portion include a second material different from the first material.

Abstract: A shift-by-wire transmission system includes a gear shifting operation portion provided at an end portion of a body and configured to shift a gear, a housing provided inside the body, a haptic element provided in contact with the housing and configured to generate a vibration when the gear is shifted to a predetermined gear shifting stage to transmit the vibration to the housing, and a groove member coupled to the gear shifting operation portion and configured to operate in conjunction with a gear shifting operation of the gear shifting operation portion and transmit the vibration of the haptic element, which is transmitted to the housing, to the gear shifting operation portion by constantly maintaining a state in contact with the housing.

Abstract: The disclosure provides a display device and a method of manufacturing the same. The display device includes a plurality of pixel circuit parts disposed on a substrate, a plurality of pixel electrodes, each disposed on the pixel circuit parts, a first insulating layer filling a space between the pixel electrodes, a plurality of light emitting elements, each disposed on the pixel electrodes, and connection electrodes disposed between the light emitting elements and the pixel electrodes. Each of the pixel electrodes includes a protrusion protruding toward a corresponding one of the connection electrodes.

Abstract: A display device includes the following elements: a semiconductor layer positioned on a substrate; a first gate insulating layer positioned on the semiconductor layer; a first gate conductive layer positioned on the first gate insulating layer; a second gate insulating layer positioned on the first gate conductive layer; a second gate conductive layer positioned on the second gate insulating layer; a first insulating layer positioned on the second gate conductive layer; a first contact hole passing through the first insulating layer, the second gate insulating layer, and the first gate insulating layer; a second contact hole passing through the first insulating layer; and a third contact hole passing through the first insulating layer and the second gate insulating layer. A cross-section of the first insulating layer in a plane perpendicular to the substrate has a curved profile.

Abstract: A deposition mask and a method for manufacturing the same are provided. A deposition mask includes: a mask substrate including a semiconductor wafer, a first coating film on the mask substrate, and a second coating film on the first coating film and including a hole pattern and a mask pattern that are alternately arranged, wherein an upper width of the hole pattern is less than a lower width thereof.

Abstract: A deposition mask includes a mask frame defining a cell opening, and a membrane including a silicon layer disposed on the mask frame and an inorganic layer disposed on the silicon layer. The membrane includes a cell region disposed above the cell opening, and the cell region has a plurality of pixel openings. Each of the pixel openings includes a first opening penetrating the inorganic layer and a second opening penetrating the silicon layer, and the second opening has a larger width than a width of the first opening.

Abstract: A deposition mask includes a mask frame defining cell openings therein, and a membrane including mask cell regions disposed above and overlapping the cell openings, respectively, and a grid region disposed between the mask cell regions. A recess is defined at a surface portion of the membrane, and the mask frame includes a rib region defining the cell openings and a lower electrode disposed to be spaced apart from the recess in a thickness direction of the mask frame.

Abstract: A deposition mask includes a mask substrate including a cell area and a cell peripheral area; a mask membrane positioned in the cell area of the mask substrate and including a pixel opening and a mask shadow surrounding the pixel opening; a first upper inorganic layer positioned on the cell peripheral area of the mask substrate and including a first protrusion that protrudes more toward the cell area than a side surface of the mask substrate; and a second upper inorganic layer positioned on the first upper inorganic layer and including a second protrusion that protrudes more toward the cell area than the side surface of the mask substrate. The mask shadow includes a first mask shadow spaced apart from the first protrusion; and a second mask shadow spaced apart from the second protrusion.

Abstract: A method for task management and a system therefor are provided. The method according to some embodiments may include generating a task list by inputting user information of a user into a first model, the task list including a plurality of tasks expected to be processed by the user, generating a plurality of items related to the plurality of tasks by inputting the user information into the first model, receiving, from the user, a selection of a task to be processed by the user from among the plurality of tasks, receiving, from the user, a selection of an item related to the selected task from among the plurality of items, composing a first prompt by inputting the selected item into a second model, the first prompt requesting the selected task to be processed based on the selected item and outputting a processing result for the selected task by inputting the first prompt into a third model.

Abstract: A method and system for automatically generating design deliverables are provided. According to the aforementioned and other embodiments of the present disclosure, a method for automatically generating design deliverables performed by a computing system is provided. The method may comprise receiving a first prompt from a user terminal and transmitting the first prompt to a generative artificial intelligence (AI) system, transmitting at least some of a plurality of images associated with the first prompt to the user terminal, receiving a user's selection input for at least one of the plurality of images associated with the first prompt from the user terminal and transmitting a first image corresponding to the user's selection input to the generative AI system and receiving a second image generated by the generative AI system based on the first image and the first prompt.

Abstract: A deposition mask includes a cell area, a cell peripheral area surrounding the cell area, and a grid area positioned between the cell area and the cell peripheral area in a plan view, the deposition mask. The deposition mask includes a mask membrane disposed in the cell area, including a mask shadow and defining a pixel opening therein; a mask frame disposed in the cell peripheral area and the gird area; and a plurality of ruler patterns disposed in the grid area, where the plurality of ruler patterns are adjacent to each other in a direction parallel to a major surface of the mask frame and spaced apart at equal intervals.

Abstract: A deposition mask includes a mask substrate including a plurality of cell areas, and a cell peripheral area surrounding the cell areas in plan view, a mask membrane overlapping the cell area of the mask substrate, defining a pixel opening, and including a mask shadow, and a mask frame overlapping the cell peripheral area, and including an upper inorganic layer above an upper surface of the mask substrate, and a lower inorganic layer below a lower surface of the mask substrate and having a height that is different than a height of the upper inorganic layer and that is greater than a height of the mask shadow.

Abstract: There is provided a deposition mask. The deposition mask includes a mask substrate comprising a plurality of cell areas and a cell peripheral area surrounding the plurality of cell areas; a mask membrane overlapping with the cell areas of the mask substrate; and a mask frame overlapping with the cell peripheral area of the mask substrate, wherein the mask membrane comprises a mask shadow defining a pixel opening, wherein the mask frame comprises a first mask inorganic layer on the mask substrate, and a second mask inorganic layer on the first mask inorganic layer, and wherein the first mask inorganic layer and the second mask inorganic layer are formed in a certain pattern up to an edge of the mask substrate.

Abstract: A deposition mask includes a mask substrate including a center area and an edge area; a plurality of cell patterns disposed on the mask substrate and including cell patterns disposed in the edge area and cell patterns disposed in the center area; and a mask frame disposed on the mask substrate and surrounding the plurality of cell patterns, where a number of cell patterns, among the cell patterns disposed in the edge area, per unit area of the edge area, among the cell patterns disposed in the center area, is greater than a number of cell patterns per unit area of the center area.

Abstract: A display device is disclosed that includes a substrate, a semiconductor layer, a first conductive layer, and a first gate insulating layer. The semiconductor layer is disposed on the substrate and includes a first area and a second area. The first conductive layer is disposed on the semiconductor layer and includes a first gate pattern overlapping the first area and a second gate pattern overlapping the second area. The first gate insulating layer is disposed between the semiconductor layer and the first conductive layer and includes a first insulating layer overlapping the first area and the second area, a second insulating layer overlapping the first area and the second area, and a third insulating layer not overlapping the first area but overlapping the second area. The second insulating layer is disposed between the first insulating layer and the third insulating layer, and has a dielectric constant greater than that of the third insulating layer.

Abstract: A deposition mask includes a silicon substrate including cell areas and a mask frame area excluding the cell areas, the mask frame area including a mask rip area partitioning the cell areas and an outer frame area disposed at an outermost portion of the silicon substrate, a mask rip disposed in the mask rip area, a mask membrane disposed in each of the cell areas, a first metal frame disposed in the outer frame area, and a second metal frame surrounding an outer portion of the silicon substrate and connected to the first metal frame.

Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

Abstract: A method for manufacturing a deposition mask includes depositing a seed metal layer on a front surface of a silicon substrate, forming a first photoresist pattern defining first openings on the seed metal layer, growing a plating layer in the first openings of the first photoresist pattern, forming a mask membrane by removing the first photoresist pattern and leaving the plating layer, depositing a protection layer to cover a front surface of the mask membrane, forming a second photoresist pattern defining cell opening corresponding to unit masks, respectively, on a back surface of the silicon substrate, exposing the seed metal layer by etching the back surface of the silicon substrate using the second photoresist pattern as a mask, exposing a back surface of the mask membrane by etching the seed metal layer using the second photoresist pattern as a mask, and removing the protection layer.

Abstract: A deposition mask includes a mask body including a silicon substrate, where a plurality of holes is defined through the mask body, and the mask body further includes mask grids extending to define the holes. A cross section of each mask grid has a reverse tapered shape having a width increasing from a back surface to an upper surface of the deposition mask, and each side surface of each mask grid defining a hole includes a first concave curved surface.

Abstract: A method for searching a content includes receiving a predefined user input with respect to a text region; extracting, in response to the predefined user input, at least one word from the text region; creating a search condition based on the extracted at least one word; and displaying a list of contents searched based on the created search condition.