Patents by Inventor Sung-Yeol Jin

Sung-Yeol Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate
    Patent number: 8968983
    Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
    Type: Grant
    Filed: August 2, 2012
    Date of Patent: March 3, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Cha-Dong Kim, Sang Hyun Yun, Jung-In Park, Su-Yeon Sim, Hi-Kuk Lee, Sang-Tae Kim, Yong-Il Kim, Shi-Jin Sung, Eun-Sang Lee, Sung-Yeol Jin
  • PHOTORESIST COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE
    Publication number: 20130040410
    Abstract: A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.
    Type: Application
    Filed: August 2, 2012
    Publication date: February 14, 2013
    Applicants: Doongwoo Fine-Chem Co., Ltd., Samsung Display Co., Ltd.
    Inventors: Cha-Dong KIM, Sang Hyun Yun, Jung-In Park, Su-Yeon Sim, Hi-Kuk Lee, Sang-Tae Kim, Yong-Il Kim, Shi-Jin Sung, Eun-Sang Lee, Sung-Yeol Jin
  • PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
    Publication number: 20110236825
    Abstract: In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: wherein R1, R2 and R3 are independently H, C1-4 alkyl, C2-4 alkenyl, C3-8 cycloalkyl, or C6-12 aryl.
    Type: Application
    Filed: January 20, 2011
    Publication date: September 29, 2011
    Inventors: Jung-In PARK, Hi-Kuk Lee, Sang-Hyun Yun, Cha-Dong Kim, Shi-Jin Sung, Sung-Yeol Jin, Sang-Tae Kim, Yong-Il Kim, Eun-Sang Lee
  • Mobile communication terminal having wireless communication module and sound output control method thereof
    Publication number: 20070207735
    Abstract: Provided are a mobile communication terminal and a sound output control method thereof. The mobile communication terminal includes a Bluetooth® module for receiving a command signal for requesting to output a sound stored in the mobile communication terminal from an external Bluetooth® device, and a sound output unit for outputting the sound, if the command signal for requesting to output the sound is received. Accordingly, since a mobile communication terminal can be controlled to ring using Bluetooth® communication, the user can conveniently find the lost mobile communication terminal.
    Type: Application
    Filed: February 14, 2007
    Publication date: September 6, 2007
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Sung-Yeol Jin