Patents by Inventor Sun-Hae KANG

Sun-Hae KANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Patent number: 10093830
    Abstract: A composition for forming a silica based layer includes a silicon-containing compound including polysilazane, polysiloxazane, or a combination thereof and one or more kinds of solvent, and having a turbidity increasing rate of less than or equal to about 0.13.
    Type: Grant
    Filed: September 1, 2015
    Date of Patent: October 9, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Wan-Hee Lim, Taek-Soo Kwak, Han-Song Lee, Eun-Su Park, Sun-Hae Kang, Bo-Sun Kim, Sang-Kyun Kim, Sae-Mi Park, Jin-Hee Bae, Jin-Woo Seo, Jun-Young Jang, Youn-Jin Cho, Kwen-Woo Han, Byeong-Gyu Hwang
  • Patent number: 9971243
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specification and * is a linking point.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 15, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yu-Shin Park, Tae-Ho Kim, Yoo-Jeong Choi, Sun-Hae Kang, Hyo-Young Kwon, Sang-Kyun Kim, Young-Min Kim, Youn-Hee Nam, Hyun-Ji Song, Byeri Yoon, Dong-Geun Lee, Seulgi Jeong
  • Patent number: 9908990
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: March 6, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sun-Hae Kang, Youn-Hee Nam, Min-Soo Kim, Dominea Rathwell, You-Jung Park, Hyun-Ji Song, Sun young Yang
  • Publication number: 20160363864
    Abstract: A polymer includes a structural unit represented by Chemical Formula 1 and an organic layer composition including the same. wherein in Chemical Formula 1, A is a carbon cyclic group including at least one hetero atom, B is one of groups in Group 1, where Ar1 to Ar4, R11 to R14, L and m are as defined in the specifiction and * is a linking point.
    Type: Application
    Filed: June 3, 2016
    Publication date: December 15, 2016
    Inventors: Yu-Shin PARK, Tae-Ho KIM, Yoo-Jeong CHOI, Sun-Hae KANG, Hyo-Young KWON, Sang-Kyun KIM, Young-Min KIM, Youn-Hee NAM, Hyun-Ji SONG, Byeri YOON, Dong-Geun LEE, Seulgi JEONG
  • Publication number: 20160304700
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Application
    Filed: November 25, 2015
    Publication date: October 20, 2016
    Inventors: Sun-Hae KANG, Youn-Hee NAM, Min-Soo KIM, Dominea RATHWELL, You-Jung PARK, Hyun-Ji SONG, Sun young YANG
  • Publication number: 20160177133
    Abstract: A composition for forming a silica based layer includes a silicon-containing compound including polysilazane, polysiloxazane, or a combination thereof and one or more kinds of solvent, and having a turbidity increasing rate of less than or equal to about 0.13.
    Type: Application
    Filed: September 1, 2015
    Publication date: June 23, 2016
    Inventors: Wan-Hee Lim, Taek-Soo Kwak, Han-Song Lee, Eun-Su Park, Sun-Hae Kang, Bo-Sun Kim, Sang-Kyun Kim, Sae-Mi Park, Jin-Hee Bae, Jin-Woo Seo, Jun-Young Jang, Youn-Jin Cho, Kwen-Woo Han, Byeong-Gyu Hwang
  • Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU