Patents by Inventor Sunjay Phatak

Sunjay Phatak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Four KHz gas discharge laser system
    Patent number: 6882674
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: April 19, 2005
    Assignee: Cymer, Inc.
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski
  • Four KHz gas discharge laser system
    Publication number: 20030118072
    Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
    Type: Application
    Filed: December 21, 2001
    Publication date: June 26, 2003
    Inventors: Christian J. Wittak, William N. Partlo, Richard L. Sandstrom, Paul C. Melcher, David M. Johns, Robert B. Saethre, Richard M. Ness, Curtis L. Rettig, Robert A. Shannon, Richard C. Ujazdowski, Shahryar Rokni, Scott T. Smith, Stuart L. Anderson, John M. Algots, Ronald L. Spangler, Igor V. Fomenkov, Thomas D. Steiger, Jerome A. Emilo, Clay C. Titus, Alex P. Ivaschenko, Paolo Zambon, Gamaralalage G. Padmabandu, Mark S. Branham, Sunjay Phatak, Raymond F. Cybulski