Abstract: The present invention relates to a method for preparing a recombinant microorganism simultaneously comprising genes encoding enzymes used in the biosynthesis pathway of 6-aminocaproic acid, which is a precursor of caprolactam, biosynthesizing 6-aminocaproic acid from the microorganism, and producing the same so as to synthesize caprolactam.

Abstract: The present invention relates to a method for preparing a recombinant microorganism simultaneously comprising genes encoding enzymes used in the biosynthesis pathway of 6-aminocaproic acid, which is a precursor of caprolactam, biosynthesizing 6-aminocaproic acid from the microorganism, and producing the same so as to synthesize caprolactam.

Abstract: A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.

Abstract: The present invention provides an insulated wire having a conductor and at least two insulating coating layers formed surrounding the conductor, wherein the insulating coating layers comprises the outermost layer thereof, which has a thickness in the range of 20 to 50% based on the total thickness of the insulating coating layers and comprises a polyimide resin; and a base insulating coating layer in contact with the conductor, which has a thickness in a range of 50 to 80% based on the total thickness of the insulating coating layers and comprises a polyamide-imide resin having an adhesion-improving agent. The insulated wire of the present invention has insulating coating layers having superior coating adhesion as well as good heat-resistance.

Abstract: A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.

Abstract: Disclosed is an insulating varnish composition including polyamideimide resin and 1 to 40 parts by weight of surface-treated silica in a sol state per 100 parts by weight of the polyamideimide resin. An insulated layer formed using the insulating varnish composition may have excellent corona discharge resistance, thereby preventing the insulation breakdown.

Abstract: Disclosed is an insulating varnish composition including an organo silica sol containing a silica covered with a dispersant in a solvent containing N-methyl-2-pyrrolidone (NMP) as a main component and a polyamidimide resin dispersed in a solvent containing NMP as a main component. An insulated layer formed from the insulating varnish composition containing inorganic insulating particles of silica uniformly dispersed therein may have excellent corona discharge resistance, thereby preventing the insulation breakdown.

Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.

Abstract: A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.