Patents by Inventor Sunny Su

Sunny Su has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hybrid water filtering cleaning and quality monitoring device
    Patent number: 11453989
    Abstract: A hybrid water filtering cleaning and quality monitoring device integrates multiple elements into one main system, including oil filtering, bacterial management, trash collection and water quality monitoring.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: September 27, 2022
    Inventors: Omar J. Negron, Andrea Curet, Sunny Su, Ben Markoch
  • Hybrid water filtering cleaning and quality monitoring device
    Publication number: 20210140132
    Abstract: A hybrid water filtering cleaning and quality monitoring device integrates multiple elements into one main system, including oil filtering, bacterial management, trash collection and water quality monitoring.
    Type: Application
    Filed: December 16, 2020
    Publication date: May 13, 2021
    Applicant: Remora Incorporated
    Inventors: Omar J. Negron, Andrea Curet, Sunny Su, Ben Markoch
  • Hybrid water filtering cleaning and quality monitoring device
    Publication number: 20200115868
    Abstract: A hybrid water filtering cleaning and quality monitoring device integrates multiple elements into one main system, including oil filtering, bacterial management, trash collection and water quality monitoring.
    Type: Application
    Filed: October 9, 2019
    Publication date: April 16, 2020
    Applicant: Remora Incorporated
    Inventors: Andrea Curet, Ben Markoch, Omar J. Negron, Sunny Su
  • Micro-etching method to replicate alignment marks for semiconductor wafer photolithography
    Patent number: 7338909
    Abstract: A method and apparatus for locally etching a substrate area the method including providing a substrate comprising a process surface; depositing a material layer over the process surface; and, applying a wet etchant to cover a targeted etching portion of the process surface while excluding an adjacent surrounding area to selectively etch the material layer overlying the targeted etching portion.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: March 4, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co. Ltd.
    Inventors: Yu-Liang Lin, Henry Lo, Chung-Long Chang, Gorge Huang, Tony Lu, Gnesh Yeh, Candy Liang, Chun-Hsien Lin, Mei Sheng Zhou, Sunny Su, Ai-Sen Liu, Cheng-Lin Huang, Li-Jui Chen, Shih Che Wang