Abstract: Provided are an extreme ultraviolet (EUV) mask having enhanced reliability and durability and a method of manufacturing the same. The EUV mask includes a substrate having a rectangular shape, a reflective multilayer positioned on the substrate and having dozens of alternating layers of two different materials, in which an edge slope area or a vertical end is formed at an outer edge portion of the reflective multilayer, and an absorption layer positioned on at least a portion of the reflective multilayer. The EUV mask may have a defect avoidance pattern which opens the edge slope area or the vertical end.

Abstract: The present disclosure describes an extreme ultra-violet (EUV) mask having improved reliability and durability and a manufacturing method thereof. The extreme ultra-violet mask includes a substrate, a reflective multilayer disposed on the substrate and comprising a plurality of each of two types of material layers alternately stacked on each other, and an absorption layer disposed on the reflective multilayer, wherein the absorption layer comprises a central transfer region and a non-transfer region, wherein an opening through the non-transfer region of the absorption layer forms a defect avoidance pattern that exposes a beam calibration point of the reflective multilayer.

Abstract: An extreme ultraviolet (EUV) mask may include a substrate having a rectangular shape, a reflective layer on the substrate and having a rectangular shape smaller than the rectangular shape of the substrate, and an absorber layer on the reflective layer. The absorber layer may have a same shape as the rectangular shape of the reflective layer. The absorber layer may include a dummy hole pattern. The dummy hole pattern may be in a rectangular frame shape along an edge portion of the absorber layer and may include a plurality of dummy holes exposing the reflective layer.

Abstract: Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.

Abstract: A reticle assembly includes a reticle plate; a reticle pattern provided on the reticle plate; and a pellicle member provided on the reticle pattern and the reticle plate. The pellicle member includes: a pellicle provided on the reticle pattern; and a pellicle frame provided on the reticle plate and surrounding the reticle pattern, and supporting the pellicle to be space apart from the reticle pattern and the reticle plate.

Abstract: Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.

Abstract: Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.

Abstract: Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.