Abstract: A virtual machine hosting environment executing on a physical machine is operable to instantiate a virtual machine that is capable of initiating I/O operations directed to a remote storage. The virtual machine hosting environment is operable to determine when an unavailability condition exists with respect to the remote storage and when such unavailability condition no longer exists. The virtual machine hosting environment is further operable to suspend the virtual machine based at least on the determination that the unavailability condition exists and to resume the virtual machine based at least on the determination that the unavailability condition no longer exists. The virtual machine hosting environment may be still further operable to save one or more pending I/O requests generated by the virtual machine in conjunction with pausing the virtual machine and to send the pending I/O request(s) to the remote storage in conjunction with resuming the virtual machine.

Abstract: A virtual machine hosting environment executing on a physical machine is operable to instantiate a virtual machine that is capable of initiating I/O operations directed to a remote storage. The virtual machine hosting environment is operable to determine when an unavailability condition exists with respect to the remote storage and when such unavailability condition no longer exists. The virtual machine hosting environment is further operable to suspend the virtual machine based at least on the determination that the unavailability condition exists and to resume the virtual machine based at least on the determination that the unavailability condition no longer exists. The virtual machine hosting environment may be still further operable to save one or more pending I/O requests generated by the virtual machine in conjunction with pausing the virtual machine and to send the pending I/O request(s) to the remote storage in conjunction with resuming the virtual machine.

Abstract: A process for evaluating a cleaning solution is described. The process includes: (a) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (b) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (c) obtaining a reference UV absorbance spectra; (d) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (e) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (f) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

Abstract: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.

Abstract: A process for evaluating a cleaning solution is described, The process includes: (a) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (b) measuring UV absorption of said sonicated solution to produce a sample UV absorbance spectra; (c) obtaining a reference UV absorbance spectra; (d) scaling said reference UV absorbance spectra to said sample UV absorbance spectra at a lower range of said UV spectrum;(e) subtracting from said reference UV absorbance spectra said sample UV absorbance spectra to produce a differential UV spectra; and (f) evaluating at or near a peak of said sample UV absorbance spectra said differential UV absorbance spectra to determine whether said sonicated solution is activated.

Abstract: A process for evaluating a cleaning solution is described. The process includes: (i) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (ii) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (iii) obtaining a reference solution, which includes a solute concentration that is similar to that of solute concentration in the sonicated solution; (iv) measuring UV absorption of the reference solution to produce a reference UV absorbance spectra; (v) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (vi) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (vii) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.

Abstract: Inventive methods, systems and compositions for sanitizing food products are described. A method for sanitizing food products includes: (a) activating a solution, which includes a solute and a solvent, by using acoustic energy to form a coherent solution including solute clusters, in which each solute cluster is organized such that at least one solute molecule is surrounded by many solvent molecules; and (b) submerging the food products into a tank containing the coherent solution to sanitize the food products.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.

Abstract: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate.

Abstract: A process for evaluating a cleaning solution is described. The process includes: (i) subjecting a solution, including a solute and a solvent, to sonic energy to create a sonicated solution; (ii) measuring UV absorption of the sonicated solution to produce a sample UV absorbance spectra; (iii) obtaining a reference solution, which includes a solute concentration that is similar to that of solute concentration in the sonicated solution; (iv) measuring UV absorption of the reference solution to produce a reference UV absorbance spectra; (v) scaling the reference UV absorbance spectra to the sample UV absorbance spectra at a lower range of the UV spectrum; (vi) subtracting from the reference UV absorbance spectra the sample UV absorbance spectra to produce a differential UV spectra; and (vii) evaluating at or near a peak of the sample UV absorbance spectra the differential UV absorbance spectra to determine whether the sonicated solution is activated.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.

Abstract: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.

Abstract: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote cleaning of the patterned integrated circuit substrate, to produce a charged solution, wherein at least a portion of the solute is present as clusters in the charged solution; and (3) conveying the charged solution for cleaning the patterned integrated circuit substrate.

Abstract: Systems, methods and compositions for effectively cleaning wounds are described. According to the present invention, wound care is promoted by the use of a charged solution and particularly in the presence of sonic energy. Inventive methods for producing a solution which promotes removal of microbes, comprising charging a solution that contains at least a solute selected to promote removal of microbes, to produce a charged solution. As a result of charging, at least a portion of the solute is present as clusters in the charged solution. Alternatively, the solute is selected to promote formation of solute clusters, which effectively remove microbes found on or inside the wound. Inventive systems for applying the charged cleaning solution includes: (i) a housing capable of holding a pressurized-charged solution; and (ii) a sonic chamber capable of introducing sonic frequency into the pressurized-charged solution to form a sonically activated charged solution.

Abstract: Systems, methods and compositions for promoting oral hygiene are described. According to the present invention, oral hygiene is promoted by the use of a charged solution on the mouth tissue. Inventive methods for producing the cleaning solution includes charging a solution, which contains at least a solute selected to promote cleaning of tissue present in mouth. As a result of charging, at least a portion of the solute is present as clusters in the charged solution. Inventive systems for producing the cleaning solution includes: (1) a charging chamber for holding a solution, which contains at least a solute selected to promote oral hygiene; and (2) a first acoustic energy source capable of vibrating said solution in said charging chamber to produce a charged solution, wherein at least a portion of said solute is present as clusters in said charged solution.

Abstract: Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate. The cleaning systems of the present invention include: a charging chamber for holding a solution, which contains at least a solute selected to promote cleaning of the integrated circuit substrate; and a first acoustic energy source capable of vibrating the solution in the charging chamber to produce a charged solution such that at least a portion of the solute is present as clusters in the charged solution.