Abstract: A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to this invention is characterized by a set of multiple straight tubes placing in parallel to one another wherein the size and/or amount of large particles, which could contaminate the plasma beam, can be controlled. The filter apparatus further comprises a set of solenoid coils which coil around the filter to generate a magnetic field to drive plasma to the targeting object or material. The filter apparatus of this present invention can reduce a number of large particles in the plasma beam and can further be designed into compacted shapes with high flexibility for adaptation in order to suit engineering demands.

Abstract: A filter apparatus for arc ion evaporator used in the cathodic arc plasma deposition system according to this invention is characterized by a set of multiple straight tubes placing in parallel to one another wherein the size and/or amount of large particles, which could contaminate the plasma beam, can be controlled. The filter apparatus further comprises a set of solenoid coils which coil around the filter to generate a magnetic field to drive plasma to the targeting object or material. The filter apparatus of this present invention can reduce a number of large particles in the plasma beam and can further be designed into compacted shapes with high flexibility for adaptation in order to suit engineering demands.