Patents by Inventor Susan Holl

Susan Holl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fullerenes to increase radiation resistance in polymer-based pellicles
    Patent number: 7288299
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Grant
    Filed: March 31, 2003
    Date of Patent: October 30, 2007
    Assignee: Intel Corporation
    Inventors: Alexander Tregub, Tim T. Chen, Susan Holl
  • Fullerenes to increase radiation resistance in polymer-based pellicles
    Patent number: 7288300
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Grant
    Filed: September 13, 2005
    Date of Patent: October 30, 2007
    Assignee: Intel Corporation
    Inventors: Alexander Tregub, Tim T. Chen, Susan Holl
  • Fullerences to increase radiation resistance in polymer-based pellicles
    Publication number: 20060008528
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Application
    Filed: September 13, 2005
    Publication date: January 12, 2006
    Inventors: Alexander Tregub, Tim Chen, Susan Holl
  • Process to optimize properties of polymer pellicles and resist for lithography applications
    Publication number: 20050203254
    Abstract: Disclosed are pellicle compositions and methods of making such pellicle compositions. The pellicle compositions provided include highly fluorinated polymers as well as fluorinated polymer/PVDF co-polymers.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 15, 2005
    Inventors: Alexander Tregub, Florence Eschbach, Fu-Chang Lo, Susan Holl
  • Fullerenes to increase radiation resistance in polymer-based pellicles
    Publication number: 20050029126
    Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.
    Type: Application
    Filed: March 31, 2003
    Publication date: February 10, 2005
    Inventors: Alexander Tregub, Tim Chen, Susan Holl