Patents by Inventor Susan K. S. Jones

Susan K. S. Jones has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresists resistant to oxygen plasmas
    Patent number: 5114827
    Abstract: The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.
    Type: Grant
    Filed: September 20, 1990
    Date of Patent: May 19, 1992
    Assignees: Microelectronics Center of N.C., University of North Carolina at Charlotte
    Inventors: Farid M. Tranjan, Thomas D. DuBois, Rudolf G. Frieser, Stephen M. Bobbio, Susan K. S. Jones
  • Photoresists resistant to oxygen plasmas
    Patent number: 4968582
    Abstract: The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.
    Type: Grant
    Filed: June 28, 1988
    Date of Patent: November 6, 1990
    Assignee: MCNC and University of NC at Charlotte
    Inventors: Farid M. Tranjan, Thomas D. DuBois, Rudolf G. Frieser, Stephen M. Bobbio, Susan K. S. Jones