Abstract: A changing table cover comprises a sheet, a pillow and a bag. The sheet includes a plurality of corner portions, at least two of which include elastic material. The pillow is affixed to a top surface of the sheet. The bag is affixed to an end portion of the sheet.

Abstract: A changing table cover comprises a sheet, a pillow and a bag. The sheet includes a plurality of corner portions, at least two of which include elastic material. The pillow is affixed to a top surface of the sheet. The bag is affixed to an end portion of the sheet.

Abstract: A changing table cover comprises a sheet, a pillow and a bag. The sheet includes a plurality of corner portions, at least two of which include elastic material. The pillow is affixed to a top surface of the sheet. The bag is affixed to an end portion of the sheet.

Abstract: A changing table cover comprises a sheet, a pillow and a bag. The sheet includes a plurality of corner portions, at least two of which include elastic material. The pillow is affixed to a top surface of the sheet. The bag is affixed to an end portion of the sheet.

Abstract: A dried blood-spotting device includes a carrier card having a window therethrough along with a punchable glass fiber paper disposed in the window for a uniform absorption of a blood droplet sample into a homogeneous circular sport. The glass fiber paper is configured for enabling improved analysis for small molecules by liquid chromatography/mass spectrometry of punched specimens of the sample absorbed glass fiber paper.

Abstract: A dried blood-spotting device includes a carrier card having a window therethrough along with a punchable glass fiber paper disposed in the window for a uniform absorption of a blood droplet sample into a homogeneous circular sport. The glass fiber paper is configured for enabling improved analysis for small molecules by a liquid chemotography/mass spectroscopy of punched specimens of the sample absorbed glass fiber paper.

Abstract: A vapor drying system includes a tank for holding a drying liquid and a heater for boiling the drying liquid in the tank to produce a vapor. A manifold is arranged in the tank for bubbling gas into the drying liquid. A controller is configured to cause the manifold to bubble gas into the drying liquid at a time when substrates to be dried are first introduced into the tank in order to quench the boiling of the drying liquid and generate a saturated vapor at a rate sufficient to achieve condensation of the drying liquid over substantially the entire surface of each of the substrates to be dried. In this way, staining of the substrates is reduced and process yield is improved.

Abstract: A method for cleaning the surface of a semiconductor wafer by removing residual slurry particles adhered to the wafer surface after chemical-mechanical polishing is provided. The semiconductor wafer is subjected to a first polishing step using a basic aqueous solution of a nonionic polymeric surfactant comprising alkylphenoxypolyethoxyethanol, preferably nonylphenoxypolyethoxyethanol, at a concentration between about 30 to about 100 ppm and a quaternary ammonium hydroxide such as TMAH at a concentration between about 2.5% and about 6% by weight. A downforce of between about 0 and 2 psi (1.4.times.10.sup.5 dynes/cm.sup.2) is applied for at least 15 seconds. A second polishing step with an applied downforce of at least 4 psi is then employed while applying purified water. The method provides at least a ten fold reduction in the number of submicronic slurry particles remaining on the wafer surface and can be completed within a commercially acceptable amount of time. In addition, particles as small as 0.007 .mu.