Patents by Inventor Susan M. Dallessandro

Susan M. Dallessandro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Solvent blend for removing flux residues
    Patent number: 4597890
    Abstract: Stable methylchloroform solvent compositions in combination with from about 3 to about 5 volume percent of 2-butanol and from about 1 to about 3 volume percent of 3-methyl-1-butyn-3-ol have been shown to be superior solvents for removing flux from circuit boards. Such compositions have no flash point and maintain excellent distribution of the components in the vapor and liquid sections of the defluxing apparatus.
    Type: Grant
    Filed: February 15, 1985
    Date of Patent: July 1, 1986
    Assignee: The Dow Chemical Company
    Inventors: Susan M. Dallessandro, Wesley L. Archer, Stephen P. Krupp
  • Flux removal solvent blend
    Patent number: 4524011
    Abstract: Superior solder flux, e.g., rosin flux, removal compositions are disclosed which have no flash point and are substantially non-corrosive toward aluminum. These compositions consist of about 0.5 to less than 2% methanol with about 3 to 10% of one or more alcohols containing 2-5 carbon atoms the balance being an inhibited 1,1,1-trichloroethane, wherein percentages are based on volume of the total composition.
    Type: Grant
    Filed: November 4, 1983
    Date of Patent: June 18, 1985
    Assignee: The Dow Chemical Company
    Inventors: Emmett L. Tasset, Susan M. Dallessandro, Warren F. Richey
  • Photoresist stripper composition and method of use
    Patent number: 4483917
    Abstract: An improved process for removing crosslinked photoresist polymer from printed circuit boards which comprises contacting the printed circuit board with methylene chloride containing from about 5 to about 10 volume percent of a mixture of methanol and methyl formate. Each additive must be present at a minimum concentration of one volume percent. Stabilizers for the methylene chloride, such as epoxides, may be present at amounts no greater than about 0.5 volume percent.
    Type: Grant
    Filed: January 9, 1984
    Date of Patent: November 20, 1984
    Assignee: The Dow Chemical Company
    Inventors: Wesley L. Archer, Susan M. Dallessandro, Vicki A. Lynn
  • Photoresist stripper composition and method of use
    Patent number: 4438192
    Abstract: An improved process for removing crosslinked photoresist polymer from printed circuit boards which comprises contacting the printed circuit board with methylene chloride containing from about 5 to about 10 volume percent of a mixture of methanol and methyl formate. Each additive must be present at a minimum concentration of one volume percent. Stabilizers for the methylene chloride, such as epoxides, may be present at amounts no greater than about 0.5 volume percent.
    Type: Grant
    Filed: February 14, 1983
    Date of Patent: March 20, 1984
    Assignee: The Dow Chemical Company
    Inventors: Wesley L. Archer, Vicki A. Lynn, Susan M. Dallessandro