Patents by Inventor Susanne Bauer-Mayer

Susanne Bauer-Mayer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Centrifuge and method for centrifuging a semiconductor wafer
    Patent number: 6503335
    Abstract: A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: January 7, 2003
    Assignee: Wacker Siltronic Gesellschaft für Halbleitermaterialien AG
    Inventors: Georg-Friedrich Hohl, Roland Brunner, Susanne Bauer-Mayer, Günther Brunner, Hans-Joachim Luthe, Franz Sollinger
  • CENTRIFUGE AND METHOD FOR CENTRIFUGING A SEMICONDUCTOR WAFER
    Publication number: 20020170576
    Abstract: A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.
    Type: Application
    Filed: October 26, 1999
    Publication date: November 21, 2002
    Inventors: GEORG-FRIEDRICH HOHL, ROLAND BRUNNER, SUSANNE BAUER-MAYER, GUNTHER BRUNNER, HANS-JOACHIM LUTHE, FRANZ SOLLINGER
  • Process for producing storage-stable silicon wafer surfaces having advantageous oxidation properties and silicon wafer fored thereby
    Patent number: 5352637
    Abstract: A process for producing silicon wafers which have a storage-stable surface and which can be thermally oxidized directly, that is to say, without a prior HF immersion bath, and without the addition of halogen-containing gases, it being possible to achieve an equal or better oxidation result than that achieved by including these measures.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: October 4, 1994
    Assignee: Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
    Inventors: Laszlo Fabry, Manfred Grundner, Dieter Graef, Susanne Bauer-Mayer, Peter John
  • Process for the hydrophilizing and/or cement-residue-removing surface treatment of silicon wafers
    Patent number: 5049200
    Abstract: Silicon wafers can be provided with a hydrophilic surface and/or freed of hering cement residues originating from the polishing operation with the aid of solutions adjusted to a pH of 8 to 14 with the aid of alkali-metal or alkaline-earth-metal compounds and containing hydrogen peroxide. These processes can even be carried out at room temperature and are remarkable for their low chemical consumption and easy manageability.
    Type: Grant
    Filed: October 5, 1988
    Date of Patent: September 17, 1991
    Assignee: Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH
    Inventors: Roland Brunner, Susanne Bauer-Mayer, Rudolf Griesshammer, Helmut Kirschner