Abstract: A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Abstract: A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Abstract: A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Abstract: A plasma reactor for treating exhaust gases of internal combustion engines is provided, the plasma reactor having a ceramic body with a plurality of channels running through it. A gas may be passed through a first set of channels, while a second set of channels contains an electrically conducting material such that a plasma is generated in the interior of the second set of channels by applying an electric voltage. Also, a method of manufacturing a plasma reactor is provided, whereby first a green ceramic body having a plurality of channels running through it is produced and sintered to form a ceramic body, and then an electrically conducting material is introduced into a second set of channels in the ceramic body.

Abstract: The invention relates to a method for producing a plasma through irradiation by microwaves, a process gas being directed into a receiver and a plasma being ignited by microwave irradiation. According to the invention, the coupled-in microwave radiation is pulsed. In this manner, it is possible to reduce the effective microwave power, accompanied by the same process result, thus permitting the process temperature to be lowered. Furthermore, when working with effectively identical coupled-in power, it is possible to increase the process rate, which means the process time can be reduced and the method can be high-scaled to large batch quantities.

Abstract: A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control the ion bombardment during the coating, a substrate voltage (US), produced independently from the coating plasma (20), is applied to the substrate, this voltage being modified during the coating. The substrate voltage (US) is usefully a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. Moreover, a wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Abstract: A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage produced independently from a coating plasma is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Abstract: Described is a method for coating surfaces using a facility having sputtering electrodes, which has at least two electrodes that are spaced apart from one another and arranged inside a process chamber, and an inlet for a process gas. The two sputtering electrodes are acted upon by a bipolarly pulsed voltage in such a way that they are alternately operated as cathodes and as anodes. In addition, the frequency of the voltage is set between 1 kHz and 1 MHz. Furthermore, and that the operating parameters are selected in such a way that in operation, the electrodes are at least partially covered by a coating material.