Patents by Inventor Susanne Schlafer

Susanne Schlafer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8709158
    Abstract: Thermal management of film deposition processes. In one aspect, a deposition system includes a vacuum chamber defining an evacuated interior volume, a deposition source disposed within the interior volume, a substrate holder disposed within the interior volume and arranged to hold a substrate with a first surface of the substrate facing the deposition source and a second surface of the substrate disposed facing away from the deposition source, and a heat sink disposed to have a first side of the heat sink in radiative thermal contact with the second surface of the substrate held by the substrate holder, the first side of the heat sink comprising a collection of features having a longitudinal dimension that is four or more times larger than a lateral dimension between the features, the features thereby dimensioned and aligned to reflect, multiple times in succession, radiative thermal emissions of the second surface of the substrate.
    Type: Grant
    Filed: August 20, 2010
    Date of Patent: April 29, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Sven Schramm, Susanne Schläfer
  • Publication number: 20120052201
    Abstract: Pallets suited to accommodate thermal gradients during processing. In one aspect, a pallet includes a pair of elongate members, a fixed elongate lateral cross member fixedly coupled to each of the elongate members, and an elongate floating lateral cross member floatingly coupled to the elongate members. The floating lateral cross member displaced from the fixedly coupled lateral cross member to define a gap therebetween.
    Type: Application
    Filed: September 7, 2010
    Publication date: March 1, 2012
    Inventors: Annemarie Flock, Andreas Sauer, Josef Hoffmann, Tobias Bergmann, Susanne Schlafer
  • Publication number: 20120040485
    Abstract: Thermal management of film deposition processes. In one aspect, a deposition system includes a vacuum chamber defining an evacuated interior volume, a deposition source disposed within the interior volume, a substrate holder disposed within the interior volume and arranged to hold a substrate with a first surface of the substrate facing the deposition source and a second surface of the substrate disposed facing away from the deposition source, and a heat sink disposed to have a first side of the heat sink in radiative thermal contact with the second surface of the substrate held by the substrate holder, the first side of the heat sink comprising a collection of features having a longitudinal dimension that is four or more times larger than a lateral dimension between the features, the features thereby dimensioned and aligned to reflect, multiple times in succession, radiative thermal emissions of the second surface of the substrate.
    Type: Application
    Filed: August 20, 2010
    Publication date: February 16, 2012
    Inventors: Sven Schramm, Susanne Schläfer