Abstract: A control system for elevators is provided with a landing call registration device provided at each of landing floors so as to be operable thereat, a landing call automatic registration portion for setting that one of the landing floors at which the landing call registration device is operated as a car call floor and registering a car call to stop one of cars at the car call floor, a response selection portion for selecting that one of elevator apparatuses which responds to a registered car call as a selected elevator, a passenger traveling time period calculation portion for setting that one of elevator doorways of the selected elevator which is provided at the car call floor as a selected doorway and calculating a passenger traveling time period corresponding to the selected doorway, and an opening/closing control portion for controlling the opening/closing operation of the selected doorway based on information from the selected elevator and information from the passenger traveling time period calculation p

Abstract: A control system for elevators controls the operations of a plurality of elevator apparatuses. The elevator apparatuses have cars and elevator doorways provided at each landing floor. The control system for the elevators is equipped with a landing call registration device, a landing call automatic registration portion, a response selection portion, a passenger traveling time period calculation portion, and an opening/closing control portion. The landing call registration device is provided at the landing floor to be operable at the landing floor. The landing call automatic registration portion sets as a car call floor the landing floor whose landing call registration device is operated, and makes a car call registration for stopping one of the cars at the car call floor.

Abstract: A control system for elevators is provided with a landing call registration device provided at each of landing floors so as to be operable thereat, a landing call automatic registration portion for setting that one of the landing floors at which the landing call registration device is operated as a car call floor and registering a car call to stop one of cars at the car call floor, a response selection portion for selecting that one of elevator apparatuses which responds to a registered car call as a selected elevator, a passenger traveling time period calculation portion for setting that one of elevator doorways of the selected elevator which is provided at the car call floor as a selected doorway and calculating a passenger traveling time period corresponding to the selected doorway, and an opening/closing control portion for controlling the opening/closing operation of the selected doorway based on information from the selected elevator and information from the passenger traveling time period calculation p

Abstract: A control system for elevators controls the operations of a plurality of elevator apparatuses. The elevator apparatuses have cars and elevator doorways provided at each landing floor. The control system for the elevators is equipped with a landing call registration device, a landing call automatic registration portion, a response selection portion, a passenger traveling time period calculation portion, and an opening/closing control portion. The landing call registration device is provided at the landing floor to be operable at the landing floor. The landing call automatic registration portion sets as a car call floor the landing floor whose landing call registration device is operated, and makes a car call registration for stopping one of the cars at the car call floor.

Abstract: A manufacturing method of a semiconductor device having a trench is provided to form, at a corner portion of the trench, an oxide film which is greater in thickness and smaller in stress than at other portions. When the trench formed in the semiconductor substrate is oxidized, it is oxidized in an oxygen environment containing dichloroethylene at a predetermined weight percent to allow the formation of an oxide film having a greater thickness at the corner portion of the trench than thickness at other portions, whereby the semiconductor device improving dielectric breakdown characteristics can be obtained.

Abstract: In a method of producing a semiconductor apparatus, which method includes a trench forming step of forming a trench in a silicon substrate and an inner wall oxidizing step of forming an oxide film on an inner wall of the trench; the inner wall oxidizing step being performed by wet oxidization with a low concentration of moisture mixed in oxygen to form the oxide film so that a stress caused between the oxide film and the silicon substrate is not greater than 3.5×109 (dyne/cm2) and a radius at a corner of the trench is 8 nm or more.

Abstract: With respect to nitriding of an oxide film on an inner wall of a trench, a method for producing a semiconductor device is provided, the method preventing the characteristic deterioration of the semiconductor device by controlling and optimizing peak nitrogen concentration in an oxide film to reduce the stress and to suppress the threshold voltage shift due to the positive charge of nitrogen.

Abstract: A manufacturing method of a semiconductor device having a trench is provided to form, at a corner portion of the trench, an oxide film which is greater in thickness and smaller in stress than at other portions. When the trench formed in the semiconductor substrate is oxidized, it is oxidized in an oxygen environment containing dichloroethylene at a predetermined weight percent to allow the formation of an oxide film having a greater thickness at the corner portion of the trench than thickness at other portions, whereby the semiconductor device improving dielectric breakdown characteristics can be obtained.

Abstract: A cylindrical apparatus for continuous sulfonation of an organic liquid is provided with an annular feeding device for permitting the organic liquid to flow in the form of a film down a reaction wall. The annular feeding device is provided with a number of slots in a horizontal and equidistant manner in a row.