Patents by Inventor Susumu SARASHINA

Susumu SARASHINA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for cleaning semiconductor wafer
    Patent number: 10692714
    Abstract: A method for cleaning a semiconductor wafer by using a chemical tank containing an SC-2 solution including, a plurality of the chemical tanks are used, and among SC-2 solutions contained in the plurality of chemical tanks, an HCl concentration in an SC-2 solution contained in a chemical tank to be finally used is lowered to the lowest to clean the semiconductor wafer. The method for cleaning a semiconductor wafer thus provided can improve the particle level in SC-2 cleaning for a semiconductor wafer without degrading the metal impurity level on the semiconductor wafer surface.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: June 23, 2020
    Assignee: SHIN-ETSU HANDOTAI CO., LTD.
    Inventors: Susumu Sarashina, Tomofumi Takano
  • METHOD FOR CLEANING SEMICONDUCTOR WAFER
    Publication number: 20190066999
    Abstract: A method for cleaning a semiconductor wafer by using a chemical tank containing an SC-2 solution including, a plurality of the chemical tanks are used, and among SC-2 solutions contained in the plurality of chemical tanks, an HCl concentration in an SC-2 solution contained in a chemical tank to be finally used is lowered to the lowest to clean the semiconductor wafer. The method for cleaning a semiconductor wafer thus provided can improve the particle level in SC-2 cleaning for a semiconductor wafer without degrading the metal impurity level on the semiconductor wafer surface.
    Type: Application
    Filed: February 22, 2017
    Publication date: February 28, 2019
    Applicant: Shin-Etsu Handotai Co., Ltd.
    Inventors: Susumu SARASHINA, Tomofumi TAKANO