Patents by Inventor Susumu Yamauchi

Susumu Yamauchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10788447
    Abstract: A liquid analyzer is one that performs analysis in a state of being immersed in a flowing analysis target liquid, and in order to simply make a good/bad determination and increase reliability, includes: a sensor adapted to, in a state where a responsive membrane is immersed in the flowing analysis target liquid, sense a predetermined component contained in the analysis target liquid; an analysis mechanism adapted to analyze the analysis target liquid with use of voltage generated in the sensor; and a resistance measurement mechanism adapted to, in the state where the responsive membrane is immersed in the flowing analysis target liquid, apply DC voltage to the responsive membrane to measure the resistance of the responsive membrane.
    Type: Grant
    Filed: November 26, 2015
    Date of Patent: September 29, 2020
    Assignees: HORIBA ADVANCED TECHNO CO., LTD., HORIBA, LTD., TOKYO METROPOLITAN GOVERNMENT
    Inventors: Akio Nakayama, Rumiko Furuya, Akio Ishii, Yasuto Kaba, Yuichi Ito, Susumu Yamauchi, Hiroaki Murakami, Atsushi Senda
  • Publication number: 20200295227
    Abstract: Provided is a method for manufacturing a semiconductor nanoparticle, the method includes performing a heat treatment of a first mixture containing a silver (Ag) salt, an alkali metal salt, a salt containing at least one of indium (In) and gallium (Ga), a sulfur source, and an organic solvent. A ratio of the number of atoms of an alkali metal to the total number of atoms of Ag and the alkali metal in the first mixture is greater than 0 and less than 1.
    Type: Application
    Filed: March 11, 2020
    Publication date: September 17, 2020
    Applicants: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, OSAKA UNIVERSITY, NICHIA CORPORATION
    Inventors: Tsukasa TORIMOTO, Tatsuya KAMEYAMA, Yuki MORI, Hiroki YAMAUCHI, Susumu KUWABATA, Taro UEMATSU, Daisuke OYAMATSU
  • Publication number: 20200263295
    Abstract: A film forming method is provided. In the film forming method, a gas of a carbon precursor containing an organic compound having an unsaturated carbon bond is supplied to a substrate, and a gas of a silicon precursor containing a silicon compound is supplied to the substrate. Further, a carbon-silicon containing film is formed on the substrate by thermally reacting the carbon precursor with the silicon precursor at a temperature lower than 800° C.
    Type: Application
    Filed: February 10, 2020
    Publication date: August 20, 2020
    Inventors: Takahiro MIYAHARA, Susumu YAMAUCHI
  • Publication number: 20200105244
    Abstract: Disclosed are a singing voice synthesis method and a singing voice synthesis system. The singing voice synthesis method includes: detecting a trigger for singing voice synthesis; reading out parameters according to a user who has input the trigger from a table in which parameters used for singing voice synthesis are recorded in association with the user; and synthesizing a singing voice by using the read-out parameters. The singing voice synthesis system includes: a detecting unit that detects a trigger for singing voice synthesis; a reading unit that reads out parameters according to a user who has input the trigger from a table in which parameters used for singing voice synthesis are recorded in association with the user; and a synthesizing unit that synthesizes a singing voice by using the read-out parameters.
    Type: Application
    Filed: June 14, 2018
    Publication date: April 2, 2020
    Inventors: DAIKI KURAMITSU, SHOKO NARA, TSUYOSHI MIYAKI, HIROMASA SHIIHARA, KENICHI YAMAUCHI, SUSUMU YAMANAKA
  • Publication number: 20190345384
    Abstract: A method of producing semiconductor nanoparticles, semiconductor nanoparticles, and a light-emitting device are provided. The method includes heat-treating a mixture containing a salt of Ag, a salt containing at least one of In and Ga, an Se supply source, and an organic solvent at a temperature in the range of above 200° C. to 370° C. In the method, the ratio of the number of Ag atoms to the total number of In and Ga atoms in the mixture is above 0.43 to 2.5. The semiconductor nanoparticles contains Ag, at least one of In and Ga, and Se. The light-emitting device includes a light conversion member containing the semiconductor nanoparticles and a semiconductor light-emitting element.
    Type: Application
    Filed: May 9, 2019
    Publication date: November 14, 2019
    Applicants: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY, OSAKA UNIVERSITY, NICHIA CORPORATION
    Inventors: Tsukasa TORIMOTO, Tatsuya KAMEYAMA, Hiroki YAMAUCHI, Chie MIYAMAE, Yuki MORI, Susumu KUWABATA, Taro UEMATSU, Daisuke OYAMATSU
  • Patent number: 10450618
    Abstract: The present invention relates to a method for identifying the variety of a hop by using an identification marker comprising at least one single nucleotide polymorphism that differs among varieties, and a method for preparing said identification marker. The present invention also provides a primer or a probe to be used in the method for identifying the variety of a hop, and a nucleic acid of a region including said identification marker. The present invention further provides a method for detecting the intrusion of different varieties in a hop sample.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: October 22, 2019
    Assignee: SUNTORY HOLDINGS LIMITED
    Inventors: Hiromasa Yamauchi, Susumu Furukubo
  • Publication number: 20190304801
    Abstract: There is provided an etching method including: a first gas supply step of supplying a reducing gas to a workpiece having a metal film formed thereon to reduce a front surface of the metal film, the workpiece being accommodated in at least one processing chamber; and subsequently, a second gas supply step of supplying an oxidizing gas for oxidizing the metal film and an etching gas composed of a ?-diketone to etch the oxidized metal film.
    Type: Application
    Filed: March 28, 2019
    Publication date: October 3, 2019
    Inventors: Susumu YAMAUCHI, Jun LIN
  • Patent number: 10199268
    Abstract: In a film forming method for forming a cobalt film on a target substrate having a recess formed in a surface thereof to fill the recess with the cobalt film, the recess is partially filled by forming a cobalt film on the target substrate by an ALD method or a CVD method using an organic metal compound gas. The cobalt film is partially etched by supplying an etching gas containing ?-diketone gas and NO gas to the target substrate. Then, the recess is further filled by forming a cobalt film on the target substrate by the ALD method or the CVD method using an organic metal compound gas.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: February 5, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Susumu Yamauchi, Jun Lin, Kazuaki Nishimura, Toshio Hasegawa
  • Publication number: 20180076087
    Abstract: In a film forming method for forming a cobalt film on a target substrate having a recess formed in a surface thereof to fill the recess with the cobalt film, the recess is partially filled by forming a cobalt film on the target substrate by an ALD method or a CVD method using an organic metal compound gas. The cobalt film is partially etched by supplying an etching gas containing ?-diketone gas and NO gas to the target substrate. Then, the recess is further filled by forming a cobalt film on the target substrate by the ALD method or the CVD method using an organic metal compound gas.
    Type: Application
    Filed: September 7, 2017
    Publication date: March 15, 2018
    Inventors: Susumu YAMAUCHI, Jun LIN, Kazuaki NISHIMURA, Toshio HASEGAWA
  • Publication number: 20170322178
    Abstract: A liquid analyzer is one that performs analysis in a state of being immersed in a flowing analysis target liquid, and in order to simply make a good/bad determination and increase reliability, includes: a sensor adapted to, in a state where a responsive membrane is immersed in the flowing analysis target liquid, sense a predetermined component contained in the analysis target liquid; an analysis mechanism adapted to analyze the analysis target liquid with use of voltage generated in the sensor; and a resistance measurement mechanism adapted to, in the state where the responsive membrane is immersed in the flowing analysis target liquid, apply DC voltage to the responsive membrane to measure the resistance of the responsive membrane.
    Type: Application
    Filed: November 26, 2015
    Publication date: November 9, 2017
    Inventors: Akio Nakayama, Rumiko Furuya, Akio Ishii, Yasuto Kaba, Yuichi Ito, Susumu Yamauchi, Hiroaki Murakami, Atsushi Senda
  • Publication number: 20100037959
    Abstract: A method of supplying a process gas comprises a step in which there is generated a process gas that is polymerizable depending on a temperature, and a step in which the thus generated process gas is supplied to a processing apparatus 4 configured to perform a predetermined process to an object to be processed W under a reduced-pressure atmosphere. When the process gas is supplied to the processing apparatus 4, a flow rate of the process gas is controlled by using a mass flow-rate control unit of a lower differential pressure type having a diaphragm 80, in which an appropriate operation range of a supply pressure is set lower than the atmospheric pressure. Thus, a supply rate (actual flow rate) of a process gas such as an HF gas that is polymerizable depending on a temperature can be precisely controlled in a stable manner.
    Type: Application
    Filed: November 13, 2007
    Publication date: February 18, 2010
    Inventors: Takayuki Kamaishi, Eiichi Komori, Susumu Yamauchi, Akifumi Hayashi