Patents by Inventor Sven HÄBERLEIN

Sven HÄBERLEIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and device for homogeneously coating 3D substrates
    Patent number: 11913108
    Abstract: A method and a device are provided for homogeneously coating surfaces of 3D substrates in a vacuum chamber which has a sputtering source, such as a planar source or a tube or double-tube source, wherein individual substrates, with a curved substrate surface directed toward the sputtering source, are able to be moved past said source in a translational manner. The sputtering source is fastened to a chamber wall within a vacuum chamber so as to have two degrees of freedom such that the sputtering source is able to be set both in terms of its spacing to a surface to be coated of a substrate, which is moved past in front of said sputtering source in a translational manner, and with respect to the surface normal of the surface to be coated proceeding from a fixed point such that the surface normal deviation is 0° at all times.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: February 27, 2024
    Assignee: FHR ANLAGENBAU GMBH
    Inventors: Sven Häberlein, Andreas Vogt, Roland Maudrich
  • METHOD AND DEVICE FOR HOMOGENEOUSLY COATING 3D SUBSTRATES
    Publication number: 20210207260
    Abstract: A method and a device are provided for homogeneously coating surfaces of 3D substrates in a vacuum chamber which has a sputtering source, such as a planar source or a tube or double-tube source, wherein individual substrates, with a curved substrate surface directed toward the sputtering source, are able to be moved past said source in a translational manner. The sputtering source is fastened to a chamber wall within a vacuum chamber so as to have two degrees of freedom such that the sputtering source is able to be set both in terms of its spacing to a surface to be coated of a substrate, which is moved past in front of said sputtering source in a translational manner, and with respect to the surface normal of the surface to be coated proceeding from a fixed point such that the surface normal deviation is 0° at all times.
    Type: Application
    Filed: February 25, 2021
    Publication date: July 8, 2021
    Applicant: FHR ANLAGENBAU GMBH
    Inventors: Sven HÄBERLEIN, Andreas VOGT, Roland MAUDRICH
  • METHOD AND DEVICE FOR HOMOGENEOUSLY COATING 3D SUBSTRATES
    Publication number: 20190078197
    Abstract: A method and a device are provided for homogeneously coating surfaces of 3D substrates in a vacuum chamber which has a sputtering source, such as a planar source or a tube or double-tube source, wherein individual substrates, with a curved substrate surface directed toward the sputtering source, are able to be moved past said source in a translational manner. The sputtering source is fastened to a chamber wall within a vacuum chamber so as to have two degrees of freedom such that the sputtering source is able to be set both in terms of its spacing to a surface to be coated of a substrate, which is moved past in front of said sputtering source in a translational manner, and with respect to the surface normal of the surface to be coated proceeding from a fixed point such that the surface normal deviation is 0° at all times.
    Type: Application
    Filed: September 12, 2018
    Publication date: March 14, 2019
    Applicant: FHR ANLAGENBAU GMBH
    Inventors: Sven HÄBERLEIN, Andreas VOGT, Roland MAUDRICH