Abstract: The reflector high-pressure discharge lamp unit has a reflector (2), a high-pressure discharge lamp (3) arranged on the axis of the reflector (2), a first base part (4) connected to the neck (16) of the reflector (2), and a second base part (5), arranged in front of the radiation/light exit opening of the reflector (2) and in the form of a mechanical auxiliary part. The end of the second supply lead (18), led to the second lamp shank (10), of the high-pressure discharge lamp (3) is electrically connected directly to the end of the second high-voltage cable (7), and this free connecting region is embedded in the second base part (5). The result of this is a high degree of shock resistance and strain relief with this lamp connection.

Abstract: The reflector high-pressure discharge lamp unit has a reflector (2), a high-pressure discharge lamp (3) arranged on the axis of the reflector (2), a first base part (4) connected to the neck (16) of the reflector (2), and a second base part (5), arranged in front of the radiation/light exit opening of the reflector (2) and in the form of a mechanical auxiliary part. According to the invention, the end of the second supply lead (18), led to the second lamp shank (10), of the high-pressure discharge lamp (3) is electrically connected directly to the end of the second high-voltage cable (7), and this free connecting region is embedded in the second base part (5). The result of this is a high degree of shock resistance and strain relief with this lamp connection.

Abstract: In a source for the generation of large-area pulsed ion or electron beams from an anode discharge electrode which has openings receiving discharge electrodes forming a vacuum arc plasma source, the discharge is safely triggered by a load which determines the total current and which consists of a parallel circuit including an ohmic resistor and a capacitor wherein the load output is adapted to the internal resistance of the pulse voltage generator. With a dimensioning of the electrical components taking into consideration given limits, a homogeneous beam of charged particles is obtained wherein the particle composition can be all the same or a homogeneous mixture of different particles depending on the choice of electrode materials.