Patents by Inventor Sy-Yuan Brian Shieh

Sy-Yuan Brian Shieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Removal of process residues on the backside of a substrate
    Patent number: 8083963
    Abstract: A substrate is processed in a process chamber comprising a substrate support having a receiving surface for receiving a substrate so that a front surface of the substrate is exposed within the chamber. An energized process gas is used to process the front surface of the substrate. A peripheral edge of the backside surface of the substrate is cleaned by raising the substrate above the receiving surface of the substrate support to a raised position, and exposing the backside surface of the substrate to an energized cleaning gas.
    Type: Grant
    Filed: April 3, 2007
    Date of Patent: December 27, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Gerardo A. Delgadino, Indrajit Lahiri, Teh-Tien Su, Sy-Yuan Brian Shieh, Ashok Sinha
  • REMOVAL OF PROCESS RESIDUES ON THE BACKSIDE OF A SUBSTRATE
    Publication number: 20080194111
    Abstract: A substrate is processed in a process chamber comprising a substrate support having a receiving surface for receiving a substrate so that a front surface of the substrate is exposed within the chamber. An energized process gas is used to process the front surface of the substrate. A peripheral edge of the backside surface of the substrate is cleaned by raising the substrate above the receiving surface of the substrate support to a raised position, and exposing the backside surface of the substrate to an energized cleaning gas.
    Type: Application
    Filed: April 3, 2007
    Publication date: August 14, 2008
    Inventors: Gerardo A. Delgadino, Indrajit Lahiri, Teh-Tien Su, Sy-Yuan Brian Shieh, Ashok Sinha