Patents by Inventor Sydney G. Slater

Sydney G. Slater has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous developable deep UV negative resist
    Patent number: 5258260
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzennelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: November 2, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Aqueous developable deep UV negative resist
    Patent number: 5258265
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: November 2, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin
    Patent number: 5178987
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##
    Type: Grant
    Filed: April 24, 1989
    Date of Patent: January 12, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins
    Patent number: 4902603
    Abstract: A light-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups.
    Type: Grant
    Filed: October 5, 1987
    Date of Patent: February 20, 1990
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner