Patents by Inventor Sydney George Slater

Sydney George Slater has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Hydroxy-amino thermally cured undercoat for 193 nm lithography
    Patent number: 7217497
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: June 8, 2004
    Date of Patent: May 15, 2007
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-amino thermally cured undercoat for 193 NM lithography
    Publication number: 20040219454
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Application
    Filed: June 8, 2004
    Publication date: November 4, 2004
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-amino thermally cured undercoat of 193 nm lithography
    Patent number: 6783916
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: August 31, 2004
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-epoxide thermally cured undercoat for 193 NM lithography
    Patent number: 6492092
    Abstract: The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: December 10, 2002
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-amino thermally cured undercoat for 193 nm lithography
    Publication number: 20020007018
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Application
    Filed: July 9, 2001
    Publication date: January 17, 2002
    Applicant: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-amino thermally cured undercoat for 193 NM lithography
    Patent number: 6323287
    Abstract: The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: November 27, 2001
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
  • Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography
    Patent number: 6054248
    Abstract: The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional isocyanate as a crosslinking agent, which is particularly useful in photolithographic coating of substrates. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.
    Type: Grant
    Filed: March 12, 1999
    Date of Patent: April 25, 2000
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Patrick Foster, Sydney George Slater, Thomas Steinhausler, Andrew J. Blakeney, John Joseph Biafore