Abstract: Adherent matrix layers such as post-etch and other post-process residues are removed from a substrate by exposing them to a vapor phase solvent to allow penetration of the vapor phase solvent into the adherent matrix layers and condensing the vapor phase solvent into the adherent matrix layers and revaporized to promote fragmentation of the matrix and facilitate removal. Megasonic energy may be transmitted via a transmission member to the adherent matrix through the solvent condensed thereon to loosen fragments and particles. The substrate is typically rotated to improve contact between the megasonic energy transmission member and the condensed solvent and achieve more uniform cleaning. A co-solvent which is soluble in the vapor phase solvent may be added to enhance removal of specific adherent matrix materials.

Abstract: Adherent matrix layers such as post-etch and other post-process residues are removed from a substrate by exposing them to a vapor phase solvent to allow penetration of the vapor phase solvent into the adherent matrix layers and condensing the vapor phase solvent into the adherent matrix layers and revaporized to promote fragmentation of the matrix and facilitate removal. Megasonic energy may be transmitted via a transmission member to the adherent matrix through the solvent condensed thereon to loosen fragments and particles. The substrate is typically rotated to improve contact between the megasonic energy transmission member and the condensed solvent and achieve more uniform cleaning. A co-solvent which is soluble in the vapor phase solvent may be added to enhance removal of specific adherent matrix materials.

Abstract: A substrate handling apparatus includes a transfer elevator and a process station disposed inside a load lock chamber. The process station includes a top module, a bottom module, and a seal ring which is disposed between the top module and the bottom module and is movable to open and close the process station. The transfer elevator has an upper station spaced above a lower station. A transfer device having a pair of transfer arms is used to transfer substrates between the transfer elevator and the process station. The transfer arms are movable toward one another to support a substrate and apart from one another to release the substrate. The transfer arms are mounted to rotate between the transfer elevator and the process station. When a substrate is being processed inside the process station, the transfer arms are disposed on opposite sides of the process station.