Patents by Inventor Sylvain Demichel

Sylvain Demichel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for Producing a Multi-Stage Recess in a Layer Structure and a Field Effect Transistor with a Multi-Recessed Gate
    Publication number: 20080064155
    Abstract: The method for forming a multi-stage recess in a layer structure comprises forming a photo-resist film atop a layer structure; a first step (49, 70) of etching the layer structure through an opening of the photo-resist film used as a mask, for forming a first stage of the recess; a step of widening the opening of the photo-resist film after the first etching step, for producing a widened opening of the photo-resist film, and a second step (58, 72) of etching the layer structure through the widened opening of the photo-resist film for forming a second stage of the multi-stage recess.
    Type: Application
    Filed: August 26, 2005
    Publication date: March 13, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Pierre Baudet, Andre Collet, Sylvain Demichel