Patents by Inventor Sylvain Rakotoarison

Sylvain Rakotoarison has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silica microspheres, method for making and assembling same and possible uses of silica microspheres
    Patent number: 7927670
    Abstract: The invention concerns silica microspheres (M) having an outer diameter between 50 and 125 ?m, preferably between 60 and 90 ?m, a wall thickness not less than 1 ?m, preferably between 1 and 3 ?m and a density between 0.3 and 0.7/cm3, a manufacturing method by injecting silica microsphere precursors (MS, PR1, PR1?, PR2?) into an inductive plasma (P), assembly methods and possible uses of silica microspheres.
    Type: Grant
    Filed: September 19, 2005
    Date of Patent: April 19, 2011
    Inventor: Sylvain Rakotoarison
  • Silica Microspheres, Method for Making and Assembling Same and Possible Uses of Silica Microspheres
    Publication number: 20070231500
    Abstract: The invention concerns silica microspheres (M) having an outer diameter between 50 and 125 ?m, preferably between 60 and 90 ?m, a wall thickness not less than 1 ?m, preferably between 1 and 3 ?m and a density between 0.3 and 0.7/cm3, a manufacturing method by injecting silica microsphere precursors (MS, PR1, PR1?, PR2?) into an inductive plasma (P), assembly methods and possible uses of silica microspheres.
    Type: Application
    Filed: September 19, 2005
    Publication date: October 4, 2007
    Inventor: Sylvain Rakotoarison
  • Method and feedstock for making photomask material
    Publication number: 20040050098
    Abstract: A method for manufacturing a photomask material includes delivering a powder containing silicon dioxide into a plasma to produce silica particles and depositing the silica particles on a deposition surface to form glass.
    Type: Application
    Filed: August 20, 2003
    Publication date: March 18, 2004
    Inventors: Laura J. Ball, Sylvain Rakotoarison
  • Method of making extreme ultraviolet lithography glass substrates
    Publication number: 20040025542
    Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.
    Type: Application
    Filed: June 5, 2003
    Publication date: February 12, 2004
    Inventors: Laura J. Ball, Sylvain Rakotoarison
  • Method for making photomask material by plasma induction
    Publication number: 20030027054
    Abstract: A method of making fused silica includes generating a plasma, delivering reactants comprising a silica precursor into the plasma to produce silica particles, and depositing the silica particles on a deposition surface to form glass.
    Type: Application
    Filed: August 1, 2001
    Publication date: February 6, 2003
    Inventors: Laura J. Ball, Sylvain Rakotoarison
  • Method and feedstock for making photomask material
    Publication number: 20030027055
    Abstract: A method for manufacturing a photomask material includes delivering a powder containing silicon dioxide into a plasma to produce silica particles and depositing the silica particles on a deposition surface to form glass.
    Type: Application
    Filed: August 1, 2001
    Publication date: February 6, 2003
    Inventors: Laura J. Ball, Sylvain Rakotoarison