Patents by Inventor Sylvia D. Mancha

Sylvia D. Mancha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5179533
    Abstract: An improved read/write optical disk is disclosed which is capable of being rewritten more than 10.sup.6 times. The disk utilizes a storage medium in which data is stored by causing a localized region of the storage medium to assume one of two states. The two states can be converted from one to another by the application of electric fields to the localized region of the storage medium. The localized region in question is selected by illuminating an area on an addressing layer directly above the region in question with light. The preferred embodiment utilizes a lead lanthanum zirconate titanate material for the storage medium.
    Type: Grant
    Filed: July 31, 1989
    Date of Patent: January 12, 1993
    Assignee: Radiant Technologies
    Inventors: Jeff A. Bullington, Sylvia D. Mancha, Christopher DeHainaut
  • Patent number: 4759823
    Abstract: A method for etching thin films of compostions from the PLZT family which have been deposited on substrates. The film is coated with a photosensitive material which is developed by photolithographic techniques to form a photoresist mask upon the film layer, the photoresist material having a predetermined pattern. The thin film coated substrate with the developed photoresist mask is immersed in a dilute etching solution containing hydrochloric acid and fluorine ion donor for a period of time sufficient to etch that portion of the thin film layer not covered with the developed photoresist, removing the thin film coated substrate after it has been etched, rinsing the substrate and then immersing the substrate in a second etching solution containing a dilute solution of a lead solubilizing medium such as nitric acid, or acetic for a period of time sufficient to remove lead residue remaining from the first etching step.
    Type: Grant
    Filed: June 2, 1987
    Date of Patent: July 26, 1988
    Assignee: Krysalis Corporation
    Inventors: Dino Asselanis, Sylvia D. Mancha