Patents by Inventor Sylvia R. R. Tousley

Sylvia R. R. Tousley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Symmetrical etching ring with gas control
    Patent number: 5498313
    Abstract: In a plasma or RIE etching tool using a uniquely designed annulus around a wafer supporting pedestal, it has been found that the introduction of one or more gases in the region immediately adjacent the annulus controls the amount of etching of features in that region in the surface of the wafer mounted on the pedestal. By so controlling the amount of gas in this region, the slope of the walls of the etched features can be also controlled.
    Type: Grant
    Filed: November 3, 1993
    Date of Patent: March 12, 1996
    Assignee: International Business Machines Corp.
    Inventors: Michael E. Bailey, Dinh Dang, James G. Michael, Timothy E. Neary, Paul W. Pastel, Sylvia R. R. Tousley, Arthur C. Winslow