Patents by Inventor Syogo Okamoto

Syogo Okamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of photomask and recording medium
    Patent number: 10151972
    Abstract: A manufacturing method of a photomask according to the embodiment sets an exposure condition applied when a resist is formed into a three-dimensional target shape by using a photomask including a plurality of light-shielding areas. Subsequently, the method sets a hypothetical target shape obtained by correcting a target shape based on a development characteristic of the resist for the exposure condition. Subsequently, the method creates a pattern of the photomask corresponding to the hypothetical target shape. Subsequently, the method simulates a prediction shape of the resist when the pattern is used. Subsequently, the method calculates a cost function related to an error between the prediction shape and the hypothetical target shape. Subsequently, the method adjusts the pattern based on a result of the calculation of the cost function.
    Type: Grant
    Filed: March 1, 2017
    Date of Patent: December 11, 2018
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Takaki Hashimoto, Satoshi Usui, Naoki Sato, Kouichi Nakayama, Masahiro Miyairi, Syogo Okamoto
  • MANUFACTURING METHOD OF PHOTOMASK AND RECORDING MEDIUM
    Publication number: 20180157167
    Abstract: A manufacturing method of a photomask according to the embodiment sets an exposure condition applied when a resist is formed into a three-dimensional target shape by using a photomask including a plurality of light-shielding areas. Subsequently, the method sets a hypothetical target shape obtained by correcting a target shape based on a development characteristic of the resist for the exposure condition. Subsequently, the method creates a pattern of the photomask corresponding to the hypothetical target shape. Subsequently, the method simulates a prediction shape of the resist when the pattern is used. Subsequently, the method calculates a cost function related to an error between the prediction shape and the hypothetical target shape. Subsequently, the method adjusts the pattern based on a result of the calculation of the cost function.
    Type: Application
    Filed: March 1, 2017
    Publication date: June 7, 2018
    Applicant: TOSHIBA MEMORY CORPORATION
    Inventors: Takaki HASHIMOTO, Satoshi Usui, Naoki Sato, Kouichi Nakayama, Masahiro Miyairi, Syogo Okamoto